Abstract: The invention relates to a glass-fiber textile structure, characterized in that it has a parylene (poly(para-xylylene)) coating with a thickness of between 5 ?m and 30 ?m, preferably between 6 ?m and 25 ?m, in particular between 7 and 20 ?m. The invention also relates to a method for reinforcing a solid material, which comprises introducing such a textile structure having a parylene coating into a fluid base material, preferably a base material comprising water and a hydraulic binder, and curing the base material.

Abstract: The invention relates to a substrate (10), especially a transparent glass substrate, provided with a thin-film multilayer comprising a functional layer (40) having reflection properties in the infrared and/or in solar radiation, especially a metallic functional layer based on silver or on a metal alloy containing silver, and two coatings (20, 60), said coatings being composed of a plurality of dielectric layers (24, 26; 64), so that the functional layer (40) is placed between the two coatings (20, 60), the functional layer (40) being deposited on a wetting layer (30) itself deposited directly onto a subjacent coating (20), characterized in that the subjacent coating (20) comprises at least one dielectric layer (24) based on nitride, especially on silicon nitride and/or aluminum nitride, and at least one noncrystalline smoothing layer (26) made from a mixed oxide, said smoothing layer (26) being in contact with said superjacent wetting layer (30).

Abstract: The invention relates to a substrate (10), especially a transparent glass substrate, provided with a thin-film multilayer comprising a functional layer (40) having reflection properties in the infrared and/or in solar radiation, especially a metallic functional layer based on silver or on a metal alloy containing silver, and two coatings (20, 60), said coatings being composed of a plurality of dielectric layers (24, 26; 64), so that the functional layer (40) is placed between the two coatings (20, 60), the functional layer (40) being deposited on a wetting layer (30) itself deposited directly onto a subjacent coating (20), characterized in that the subjacent coating (20) comprises at least one dielectric layer (24) based on nitride, especially on silicon nitride and/or aluminum nitride, and at least one noncrystalline smoothing layer (26) made from a mixed oxide, said smoothing layer (26) being in contact with said superjacent wetting layer (30).

Abstract: The invention relates to a transparent or semi-transparent substrate having, over at least a portion of at least one of its surfaces, a photocatalytic coating based on titanium oxide and characterized in that the coated surface has a luminous reflectance less than that of a non-coated surface of the substrate. The invention also relates to methods for obtaining a substrate of this type and to uses for this substrate.

Abstract: The invention relates to a substrate for an organic light-emitting device especially a transparent glass substrate, which includes, on a first main face a bottom electrode film the electrode film being formed from a thin-film multilayer coating comprising, in succession, at least a contact layer based on a metal oxide and/or a metal nitride; a metallic functional layer having an intrinsic electrical conductivity property; an overlayer based on the metal oxide and/or a metal nitride, especially for matching the work function of said electrode film, said substrate including a base layer, the base layer covering the main face.

Abstract: A substrate for an organic light-emitting device, especially a transparent glass substrate, which includes, on a first main face, a bottom electrode film, the electrode film being formed from a thin-film multilayer coating comprising, in succession, at least: a contact layer based on a metal oxide and/or a metal nitride; a metallic functional layer having an intrinsic electrical conductivity property; an overlayer based on the metal oxide and/or a metal nitride, especially for matching the work function of said electrode film, said substrate including a base layer, said base layer covering said main face.

Abstract: The subject of the invention is a substrate that can be used as a substrate for the epitaxial growth of layers based on gallium nitride and comprising a support material (11, 21) coated on at least one of its faces with at least one multilayered stack comprising at least one zinc-oxide-based layer (13, 24). The substrate is coated with a semiconductor structure of III-N or II-VI type, and it is characterized in that placed between the support material (11, 21) and said at least one zinc-oxide-based layer (13, 24) is at least one intermediate layer (12, 23) comprising oxides with at least two elements chosen from tin (Sn), zinc (Zn), indium (In), gallium (Ga) and antimony (Sb).

Abstract: The invention relates to a scintillator material comprising a cerium-doped rare-earth silicate, characterized in that its absorbance at a wavelength of 357 nm is less than its absorbance at 280 nm. This material has an afterglow of generally less than 200 ppm after 100 ms relative to the intensity measured during an X-ray irradiation. It is preferably codoped. It may be obtained using an oxidizing anneal. It is particularly suited to integration in an ionizing particle detector that may be used in a medical imaging apparatus.

Abstract: The invention relates to a substrate (10), especially a transparent glass substrate, provided with a thin-film multilayer coating comprising an alternation of n functional layers (40) having reflection properties in the infrared and/or in solar radiation, especially metallic functional layers based on silver or on metal alloy containing silver, and (n+1) dielectric films (20, 60), where n?1, said films being composed of a layer or a plurality of layers (22, 24, 62, 64), at least one of which is made of a dielectric material, so that each functional layer (40) is placed between at least two dielectric films (20, 60), characterized in that at least one functional layer (40) includes a blocker film (30, 50) consisting of at least one interface layer (32, 52) immediately in contact with said functional layer, this interface layer being based on titanium oxide TiOx.

Abstract: The invention relates to a photovoltaic cell (1) having an absorbent photovoltaic material, especially a cadmium-based material, said cell comprising a front face substrate (10), especially a transparent glass substrate, having, on a main surface, a transparent electrode coating (100) consisting of a thin-film stack that includes at least one metallic functional layer (40), especially one based on silver, and at least two antireflection coatings (20, 60), said antireflection coatings each comprising at least one antireflection layer (24, 26; 66, 68), said functional layer (40) being placed between the two antireflection coatings (20, 60), characterized in that the antireflection coating (60) placed above the metallic functional layer (40) on the opposite side from the substrate comprises at least two antireflection layers (66, 68), the antireflection layer (68) furthest from the metallic functional layer (40) being more resistive than the antireflection layer (66) closest to the metallic functional layer (40)

Abstract: The invention relates to a photovoltaic cell having an absorbent photovoltaic material, said cell comprising a front face substrate (10), especially a transparent glass substrate, having, on a main surface, a transparent electrode coating (100) consisting of a thin-film stack that includes a metallic functional layer (40), especially one based on silver, and at least two antireflection coatings (20, 60), characterized in that the antireflection coating (60) placed above the metallic functional layer (40) on the opposite side from the substrate has an optical thickness equal to about four times the optical thickness of the antireflection coating (20) placed beneath the metallic functional layer (40) in the direction of the substrate.

Abstract: The invention relates to a photovoltaic cell (1) having an absorbent photovoltaic material, said cell comprising a front face substrate (10), especially a transparent glass substrate, having, on a main surface, a transparent electrode coating (100) consisting of a thin-film stack that includes a metallic functional layer (40), especially one based on silver, and at least two antireflection coatings (20, 60), characterized in that the antireflection coating (20) placed beneath the metallic functional layer (40) in the direction of the substrate has an optical thickness equal to about one eighth of the maximum absorption wavelength of the photovoltaic material and the antireflection coating (60) placed above the metallic functional layer (40) on the opposite side from the substrate has an optical thickness equal to about one half of the maximum absorption wavelength of the photovoltaic material.

Abstract: The subject of the invention is a substrate that can be used as a substrate for the epitaxial growth of layers based on gallium nitride and comprising a support material (11, 21) coated on at least one of its faces with at least one multilayered stack comprising at least one zinc-oxide-based layer (13, 24). The substrate is coated with a semiconductor structure of III-N or II-VI type, and it is characterized in that placed between the support material (11, 21) and said at least one zinc-oxide-based layer (13, 24) is at least one intermediate layer (12, 23) comprising oxides with at least two elements chosen from tin (Sn), zinc (Zn), indium (In), gallium (Ga) and antimony (Sb).

Abstract: The invention relates to a photovoltaic cell comprising a photovoltaic absorbent material, said cell including a front face substrate (10), particularly a transparent glass substrate. A main surface of the substrate is provided with a transparent electrode coating (100) formed by a stack of thin layers including at least one metal functional layer (40) based, in particular, on silver, and at least two anti-reflective coatings (20, 60). The invention is characterised in that the anti-reflective coating (60) disposed on top of the metal functional layer (40) on the side opposite that of substrate includes a current-conducting layer (66) located farthest from the substrate and having a resistivity ? of between 2.10?4 ?·cm and 10 ?·cm, based, in particular, on TCO.

Abstract: The invention relates to a substrate (1) for an organic light-emitting device (10), especially a transparent glass substrate, which includes, on a first main face (11), a bottom electrode film (3), the electrode film (3) being formed from a thin-film multilayer coating comprising, in succession, at least: a contact layer (31) based on a metal oxide and/or a metal nitride; a metallic functional layer (32) having an intrinsic electrical conductivity property; an overlayer (34) based on the metal oxide and/or a metal nitride, especially for matching the work function of said electrode film, said substrate including a base layer (2), said base layer (2) covering said main face (11).

Abstract: The invention relates to a substrate (10), especially a transparent glass substrate, provided with a thin-film multilayer coating comprising an alternation of n functional layers (40) having reflection properties in the infrared and/or in solar radiation, especially metallic functional layers based on silver, and (n+1) dielectric films (20, 60), where n?1, said films being composed of a layer or a plurality of layers (22, 24, 62, 64), so that each functional layer (40) is placed between at least two dielectric films (20, 60), characterized in that at least one functional layer (40) includes a blocker film (30, 50) consisting of: on the one hand, an interface layer (32, 52) immediately in contact with said functional layer, this interface layer being made of a material that is not a metal; and on the other hand, at least one metal layer (34, 54) made of a metallic material, immediately in contact with said interface layer (32, 52).

Abstract: The invention relates to a substrate (10), especially a transparent glass substrate, provided with a thin-film multilayer comprising a functional layer (40) having reflection properties in the infrared and/or in solar radiation, especially a metallic functional layer based on silver or on a metal alloy containing silver, and two coatings (20, 60), said coatings being composed of a plurality of dielectric layers (24, 26; 64), so that the functional layer (40) is placed between the two coatings (20, 60), the functional layer (40) being deposited on a wetting layer (30) itself deposited directly onto a subjacent coating (20), characterized in that the subjacent coating (20) comprises at least one dielectric layer (24) based on nitride, especially on silicon nitride and/or aluminum nitride, and at least one noncrystalline smoothing layer (26) made from a mixed oxide, said smoothing layer (26) being in contact with said superjacent wetting layer (30).

Abstract: The invention relates to a substrate (10), especially a transparent glass substrate, provided with a thin-film multilayer coating comprising an alternation of n functional layers (40) having reflection properties in the infrared and/or in solar radiation, especially metallic functional layers based on silver or on metal alloy containing silver, and (n+1) dielectric films (20, 60), where n>1, said films being composed of a layer or a plurality of layers (22, 24, 62, 64), at least one of which is made of a dielectric material, so that each functional layer (40) is placed between at least two dielectric films (20, 60) , characterized in that at least one functional layer (40) includes a blocker film (30, 50) consisting of at least one interface layer (32, 52) immediately in contact with said functional layer, this interface layer being based on titanium oxide TiOx.

Abstract: The invention relates to a transparent or semi-transparent substrate having, over at least a portion of at least one of its surfaces, a photocatalytic coating based on titanium oxide and characterized in that the coated surface has a luminous reflectance less than that of a non-coated surface of the substrate.