Patents by Inventor Eric Michel
Eric Michel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12644177Abstract: A metal substrate with a silicon oxide based layer having a thickness between 80 and 400 nm and having between 5 and 30 atom % of carbon. Also included is a process for depositing by PECVD a silicon oxide based layer, having a thickness comprised between 80 and 400 nm and comprising between 5 and 30 atom % of carbon, on a metal substrate.Type: GrantFiled: December 17, 2019Date of Patent: June 2, 2026Assignee: AGC GLASS EUROPEInventors: Grégory Arnoult, Eric Michel
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Publication number: 20260062344Abstract: The present invention concerns glass substrate (10) bearing a multilayer coating comprising a protective layer (P) of boron doped silicon oxide, wherein the boron doped silicon oxide comprises Si, O, B, and OH groups and wherein the boron content is comprised between 4 at 12 atomic %. The present invention further comprises a process for depositing on a glass substrate by linear hollow cathode type PECVD a boron doped silicon oxide layer comprising Si, O, B, and OH groups and wherein the boron content is comprised between 4 at 12 atomic %.Type: ApplicationFiled: July 25, 2023Publication date: March 5, 2026Inventors: Eric MICHEL, Eric TIXHON
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Publication number: 20260043140Abstract: The present invention concerns a polymer substrate bearing a decorative coating comprising a protective toplayer of boron doped silicon oxide, wherein the boron doped silicon oxide comprises Si, O, B, H and OH groups and wherein the boron content is comprised between 4 and 12 atomic %. The present invention further comprises a process for depositing on a polymer substrate by linear hollow cathode type PECVD a boron doped silicon oxide layer comprising Si, O, B, H and OH groups and wherein the boron content is comprised between 4 and 12 atomic %.Type: ApplicationFiled: July 25, 2023Publication date: February 12, 2026Inventors: Eric MICHEL, Eric TIXHON
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Publication number: 20220018021Abstract: A metal substrate with a silicon oxide based layer having a thickness between 80 and 400 nm and having between 5 and 30 atom % of carbon. Also included is a process for depositing by PECVD a silicon oxide based layer, having a thickness comprised between 80 and 400 nm and comprising between 5 and 30 atom % of carbon, on a metal substrate.Type: ApplicationFiled: December 17, 2019Publication date: January 20, 2022Applicant: AGC GLASS EUROPEInventors: Grégory ARNOULT, Eric MICHEL
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Patent number: 10247794Abstract: A magnetic field monitoring probe includes a first container having a sample configured to emit a magnetic resonance (MR) signal included therein; a radio frequency (RF) coil inserted into the first container and configured to receive an MR signal emitted from the sample; and a second container surrounding the first container and having a matching liquid injected thereinto.Type: GrantFiled: March 17, 2017Date of Patent: April 2, 2019Assignees: SAMSUNG ELECTRONICS CO., LTD., UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITYInventors: Young Tae Kim, Eric Michel, Soo Yeol Lee
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Patent number: 10206574Abstract: Disclosed are an apparatus and method for imaging electrical properties of brain tissues including conductivity and permittivity using magnetic resonance imaging (MRI) signals. Electrical properties images for conductivity and permittivity of brain tissues may be obtained with high spatial resolution and high accuracy, without using a derivative which significantly amplifies noise in an MRI image, by calculating water content based on a ratio of MRI signals, calculating electrical properties from the calculated water content, and acquiring an electrical properties image for the calculated electrical properties.Type: GrantFiled: June 20, 2016Date of Patent: February 19, 2019Assignees: UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY, SAMSUNG ELECTRONICS CO., LTD.Inventors: Soo Yeol Lee, Eric Michel
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Patent number: 10023961Abstract: An installation, comprising a chamber comprising two ends, a transport unit and a support unit which introduce a two-sided substrate into the chamber, a stabilized high-voltage high-frequency power supply of at least 200 kW, comprising an HF transformer comprising a primary and a secondary circuit connected to terminals, at least two electrodes being connected to the terminals of the secondary circuit, said electrodes being placed on each side of the substrate, at least one dielectric barrier placed between the at least two electrodes; a power supply regulation/control unit placed upstream of the HF transformer that is capable of increasing an active power/reactive power ratio, an introducing unit for introducing at least one reactive substance into the chamber, and an extracting unit for extracting residual substances, wherein an adjustable inductor is placed in the secondary circuit of the transformer in parallel with a circuit comprising the at least two electrodes, and the adjustable inductor enables a phType: GrantFiled: April 29, 2014Date of Patent: July 17, 2018Assignee: AGC Glass EuropeInventors: Eric Tixhon, Joseph Leclercq, Eric Michel
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Patent number: 9772877Abstract: A method for managing I/O operations in a shared file system environment. The method includes receiving for each of a plurality of compute nodes, information associated with I/O accesses to a shared file system, and applications for executing the I/O accesses. The method includes creating application profiles, based, at least in part, on the received information. The method then includes determining execution priorities for the application, based, at least in part, on the created application profiles.Type: GrantFiled: December 29, 2015Date of Patent: September 26, 2017Assignee: Lenovo Enterprise Solution (Singapore) PTE., LTD.Inventors: Ludovic Enault, Eric Michel, Nicolas Tallet, Pascal Vezolle
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Publication number: 20170269178Abstract: A magnetic field monitoring probe includes a first container having a sample configured to emit a magnetic resonance (MR) signal included therein; a radio frequency (RF) coil inserted into the first container and configured to receive an MR signal emitted from the sample; and a second container surrounding the first container and having a matching liquid injected thereinto.Type: ApplicationFiled: March 17, 2017Publication date: September 21, 2017Applicants: SAMSUNG ELECTRONICS CO., LTD., UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITYInventors: Young Tae KIM, Eric Michel, Soo Yeol LEE
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Patent number: 9632836Abstract: Disclosed is a method for scheduling applications for a clustered computer system having a plurality of computers and at least one resource, the clustered computer system executing one or more applications. A method includes: monitoring hardware counters in at least one of the resources and the plurality of computers of the clustered computer system for each of the applications; responsive to said monitoring, determining the utilization of at least one of the resources and the plurality of computers of the clustered computer system by each of the applications; for each of the applications, storing said utilization of at least one of the resource and plurality of computers of the clustered computer system; and upon receiving a request to schedule an application on one of said computers, scheduling a computer to execute the application based on stored utilization for the application and stored utilizations of other applications executing on the computers.Type: GrantFiled: June 17, 2015Date of Patent: April 25, 2017Assignee: International Business Machines CorporationInventors: Eric Michel, Nicolas Tallet, Francois Thomas, Pascal Vezolle
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Publication number: 20160367141Abstract: Disclosed are an apparatus and method for imaging electrical properties of brain tissues including conductivity and permittivity using magnetic resonance imaging (MRI) signals. Electrical properties images for conductivity and permittivity of brain tissues may be obtained with high spatial resolution and high accuracy, without using a derivative which significantly amplifies noise in an MRI image, by calculating water content based on a ratio of MRI signals, calculating electrical properties from the calculated water content, and acquiring an electrical properties image for the calculated electrical properties.Type: ApplicationFiled: June 20, 2016Publication date: December 22, 2016Applicant: UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITYInventors: Soo Yeol Lee, Eric Michel
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Patent number: 9401265Abstract: The invention relates to a device for treating the surface of a substrate by means of dielectric barrier discharge for generating a filamentary plasma, including a reaction chamber comprising a mixture having a composition such that, when in contact with the plasma, the mixture decomposes and generates species capable of deposition in the form of a layer mostly or totally on the substrate, wherein at least two electrodes area provided in said chamber, with one electrode being subjected to a high AC voltage, and are arranged on either side of the substrate, at least one dielectric barrier (DBD) arranged between said at least two electrodes, and a THT/HF transformer comprising a secondary circuit, in which a direct current (DC) power source is provided in series in the secondary circuit such that the chemical species generated in the plasma in the form of electrically positive or negative ions are selectively attracted by the target substrate inserted in the reaction chamber and arranged between said at least tType: GrantFiled: November 23, 2010Date of Patent: July 26, 2016Assignee: AGC Glass EuropeInventors: Eric Michel, Eric Tixhon, Joseph Leclercq
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Patent number: 9378932Abstract: The present invention relates to a process for preventing substrate damages in an installation for surface treatment by dielectric barrier discharge (DBD) and a surface treatment DBD installation for carrying out such process. It comprises:—detecting the amplitude of the voltage at the terminals of the electrodes and the amplitude of the current circulating between said electrodes;—defining the maximum number of alternations of voltage at the terminals of the electrodes in the presence of a hot electric arc (n max) in order not to exceed 50 Joules as dissipated energy in said substrate;—when a hot electric arc appears between said electrodes, modifying with inverse feedback the voltage at the terminals of said electrodes before the defined maximum number of alternations of voltage at the terminals of the electrodes is reached.Type: GrantFiled: July 9, 2013Date of Patent: June 28, 2016Assignee: ASAHI GLASS COMPANY, LIMITEDInventors: Eric Tixhon, Joseph Leclercq, Eric Michel
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Publication number: 20160110219Abstract: A method for managing I/O operations in a shared file system environment. The method includes receiving for each of a plurality of compute nodes, information associated with I/O accesses to a shared file system, and applications for executing the I/O accesses. The method includes creating application profiles, based, at least in part, on the received information. The method then includes determining execution priorities for the application, based, at least in part, on the created application profiles.Type: ApplicationFiled: December 29, 2015Publication date: April 21, 2016Inventors: Ludovic Enault, Eric Michel, Nicholas Tallet, Pascal Vezolle
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Patent number: 9244939Abstract: A method for managing I/O operations in a shared file system environment. The method includes receiving for each of a plurality of compute nodes, information associated with I/O accesses to a shared file system, and applications for executing the I/O accesses. The method includes creating application profiles, based, at least in part, on the received information. The method then includes determining execution priorities for the application, based, at least in part, on the created application profiles.Type: GrantFiled: June 27, 2013Date of Patent: January 26, 2016Assignee: Lenovo Enterprise Solutions (Singapore) PTE. LTD.Inventors: Ludovic Enault, Eric Michel, Nicolas Tallet, Pascal Vezolle
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Publication number: 20160004567Abstract: Disclosed is a method for scheduling applications for a clustered computer system having a plurality of computers and at least one resource, the clustered computer system executing one or more applications. A method includes: monitoring hardware counters in at least one of the resources and the plurality of computers of the clustered computer system for each of the applications; responsive to said monitoring, determining the utilization of at least one of the resources and the plurality of computers of the clustered computer system by each of the applications; for each of the applications, storing said utilization of at least one of the resource and plurality of computers of the clustered computer system; and upon receiving a request to schedule an application on one of said computers, scheduling a computer to execute the application based on stored utilization for the application and stored utilizations of other applications executing on the computers.Type: ApplicationFiled: June 17, 2015Publication date: January 7, 2016Inventors: Eric Michel, Nicolas Tallet, Francois Thomas, Pascal Vezolle
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Publication number: 20150206718Abstract: The present invention relates to a process for preventing substrate damages in an installation for surface treatment by dielectric barrier discharge (DBD) and a surface treatment DBD installation for carrying out such process. It comprises:—detecting the amplitude of the voltage at the terminals of the electrodes and the amplitude of the current circulating between said electrodes;—defining the maximum number of alternations of voltage at the terminals of the electrodes in the presence of a hot electric arc (n max) in order not to exceed 50 Joules as dissipated energy in said substrate;—when a hot electric arc appears between said electrodes, modifying with inverse feedback the voltage at the terminals of said electrodes before the defined maximum number of alternations of voltage at the terminals of the electrodes is reached.Type: ApplicationFiled: July 9, 2013Publication date: July 23, 2015Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Eric Tixhon, Joseph Leclercq, Eric Michel
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Patent number: 9005718Abstract: A process for the simultaneous deposition of films onto both sides of a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (106, 206) or making said substrate run therethrough, in which chamber at least two electrodes (110, 210) are placed. At least one dielectric barrier (14, 114) is placed between these at least two electrodes (110, 210). An adjustable inductor (L) is placed in the secondary circuit of the transformer in parallel with the circuit comprising the at least two electrodes. A high-frequency electrical voltage is generated, said voltage being such that it generates a filamentary plasma (112, 212) on each side of the substrate between the at least two electrodes (110, 210).Type: GrantFiled: July 16, 2009Date of Patent: April 14, 2015Assignee: AGC Glass EuropeInventors: Eric Tixhon, Joseph Leclercq, Eric Michel
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Patent number: 8990830Abstract: A method and system are provided for thread management in parallel processes in a multi-core or multi-node system. The method includes receiving monitored hardware metrics information from the multiple cores or multiple nodes on which processes are executed, receiving monitored process and thread information; and globally monitoring the processing across the multiple cores or multiple nodes. The method further includes analyzing the monitored information to minimize imbalances between the multiple cores and/or to improve core or node exploitation and dynamically adjusting the number of threads per process based on the analysis.Type: GrantFiled: July 10, 2012Date of Patent: March 24, 2015Assignee: International Business Machines CorporationInventors: Yaoqing Gao, Francois Gibello, Eric Michel, Nicolas Tallet, Pascal Vezolle
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Publication number: 20150006593Abstract: A method for managing I/O operations in a shared file system environment. The method includes receiving for each of a plurality of compute nodes, information associated with I/O accesses to a shared file system, and applications for executing the I/O accesses. The method includes creating application profiles, based, at least in part, on the received information. The method then includes determining execution priorities for the application, based, at least in part, on the created application profiles.Type: ApplicationFiled: June 27, 2013Publication date: January 1, 2015Inventors: Ludovic Enault, Eric Michel, Nicolas Tallet, Pascal Vezolle