Patents by Inventor Eric Oswald
Eric Oswald has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12011466Abstract: The invention relates to the field of modified Escherichia coli strain Nissle 1917 (EcN) and its use for treating gastro-intestinal disorders. The invention is based on the study of the mechanisms implicated in the probiotic properties of the Escherichia coli strain Nissle 1917 (EcN). This study has allowed the inventors to decouple the probiotic activity of EcN from its genotoxic activity by demonstrating that EcN ClbP protein, the enzyme that activates the genotoxin colibactin, is also required for the siderophore-microcins activity of probiotic EcN, but interestingly, not its enzymatic domain that cleaves precolibactin to form active colibactin.Type: GrantFiled: July 7, 2020Date of Patent: June 18, 2024Assignees: INSERM (INSTITUT NATIONAL DE LA SANTÉ ET DE LA RECHERCHE MÉDICALE), UNIVERSITÉ PAUL SABATIER TOULOUSE III, ECOLE NATIONALE VÉTÉRINAIRE DE TOULOUSE, INSTITUT NATIONAL DE RECHERCHE POUR L'AGRICULTURE, L'ALIMENTATION ET L'ENVIRONNEMENT, CENTRE HOSPITALIER UNIVERSITAIRE DE TOULOUSEInventors: Eric Oswald, Jean-Philippe Nougayrede, Clémence Massip, Patricia Martin, Priscilla Branchu
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Patent number: 11912645Abstract: The invention is based on the discovery of a new bacterial compound with analgesic properties which could be used as a new tool for the treatment of pain disorders such as visceral pain. Studying the mechanisms implicated in analgesic properties of the probiotic Escherichia coli strain Nissle 1917 (EcN), inventors characterized, the amino fatty acids produced by EcN, which display the Ecn analgesic properties. One of these compounds inhibits the hypersensitivity to colorectal distension induced by capsaicin, which is a very powerful nociceptive compound and acts via the GABA B receptor. Furthermore, inventors demonstrate that this compound is able to cross the cellular epithelial barrier (such as the intestinal epithelium). Thus, the invention relates to a lipopetide compound, derived from gamma-aminobutyric acid. The invention also relates to a lipopeptide compound according to the invention for the treatment of treating pain disorder, such as somatic pain and visceral pain.Type: GrantFiled: April 27, 2018Date of Patent: February 27, 2024Assignees: INSERM (INSTITUT NATIONAL DE LA SANTÉ ET DE LA RECHERCHE MÉDICALE), CENTRE HOSPITALIER UNIVERSITAIRE DE TOULOUSE, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE—CNRS—, ECOLE NATIONALE VETERINAIRE DE TOULOUSE, UNIVERSITE PAUL SABATIER TOULOUSE III, INSTITUT NATIONAL DE RECHERCHE POUR L'AGRICULTURE, L'ALIMENTATION ET L'ENVIRONNEMENT, UNIVERSITE DE MONTPELLIER, ECOLE NATIONALE SUPERIEURE DE CHIMIE DE MONTPELLIERInventors: Nicolas Cenac, Justine Bertrand-Michel, Teresa Perez-Berezo, Thierry Durand, Jean-Marie Galano, Julien Pujo, Eric Oswald, Patricia Martin, Pauline Le Faouder, Alexandre Guy
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Publication number: 20220304965Abstract: The invention is based on the discovery of a new bacterial compound with analgesic properties which could be used as a new tool for the treatment of pain disorders such as visceral pain. Studying the mechanisms implicated in analgesic properties of the probiotic Escherichia coli strain Nissle 1917 (EcN), inventors characterized, the amino fatty acids produced by EcN, which display the Ecn analgesic properties. One of these compounds inhibits the hypersensitivity to colorectal distension induced by capsaicin, which is a very powerful nociceptive compound and acts via the GABA B receptor. Furthermore, inventors demonstrate that this compound is able to cross the cellular epithelial barrier (such as the intestinal epithelium). Thus, the invention relates to a lipopeptide compound, derived from gamma-aminobutyric acid. The invention also relates to a lipopeptide compound according to the invention for the treatment of treating pain disorder, such as somatic pain and visceral pain.Type: ApplicationFiled: April 15, 2022Publication date: September 29, 2022Inventors: Nicolas CENAC, Justine BERTRAND-MICHEL, Teresa PEREZ-BEREZO, Thierry DURAND, Jean-Marie GALANO, Julien PUJO, Eric OSWALD, Patricia MARTIN, Pauline LE FAOUDER, Alexandre GUY
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Publication number: 20220265731Abstract: The invention relates to the field of modified Escherichia coli strain Nissle 1917 (EcN) and its use for treating gastro-in-testinal disorders. The invention is based on the study of the mechanisms implicated in the probiotic properties of the Escherichia coli strain Nissle 1917 (EcN). This study has allowed the inventors to decouple the probiotic activity of EcN from its genotoxic activity by demonstrating that EcN ClbP protein, the enzyme that activates the genotoxin colibactin, is also required for the siderophore-microcins activity of probiotic EcN, but interestingly, not its enzymatic domain that cleaves precolibactin to form active colibactin.Type: ApplicationFiled: July 7, 2020Publication date: August 25, 2022Inventors: Eric Oswald, Jean-Philippe Nougayrede, Clémence Massip, Patricia Martin, Priscilla Branchu
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Patent number: 10709776Abstract: The present invention relates to ex vivo method for producing outer membrane vesicles (OMVs) by expression or overexpression of the hemolysin F gene (hlyF) in gram-negative bacterium.Type: GrantFiled: April 7, 2015Date of Patent: July 14, 2020Assignees: INSERM (INSTITUT NATIONAL DE LA SANTÉ ET DE LA RECHERCHE MÉDICALE), CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), INSTITUT NATIONAL DE RECHERCHE POUR L'AGRICULTURE, L'ALIMENTATION ET L'ENVIRONNEMENT, UNIVERSITÉ PAUL SABATIER TOULOUSE III, CENTRE HOSPITALIER UNIVERSITAIRE DE TOULOUSEInventors: Eric Oswald, Patricia Martin, Kazunori Murase
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Publication number: 20200048187Abstract: The invention is based on the discovery of a new bacterial compound with analgesic properties which could be used as a new tool for the treatment of pain disorders such as visceral pain. Studying the mechanisms implicated in analgesic properties of the probiotic Escherichia coli strain Nissle 1917 (EcN), inventors characterized, the amino fatty acids produced by EcN, which display the Ecn analgesic properties. One of these compounds inhibits the hypersensitivity to colorectal distension induced by capsaicin, which is a very powerful nociceptive compound and acts via the GABA B receptor. Furthermore, inventors demonstrate that this compound is able to cross the cellular epithelial barrier (such as the intestinal epithelium). Thus, the invention relates to a lipopetide compound, derived from gamma-aminobutyric acid. The invention also relates to a lipopeptide compound according to the invention for the treatment of treating pain disorder, such as somatic pain and visceral pain.Type: ApplicationFiled: April 27, 2018Publication date: February 13, 2020Inventors: Nicolas CENAC, Justine BERTRAND-MICHEL, Teresa PEREZ-BEREZO, Thierry DURAND, Jean-Marie GALANO, Julien PUJO, Eric OSWALD, Patricia MARTIN, Pauline LE FAOUDER, Alexandre GUY
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Publication number: 20170112913Abstract: The present invention relates to ex vivo method for producing outer membrane vesicles (OMVs) by expression or overexpression of the hemolysin F gene (hlyF) in gram-negative bacterium.Type: ApplicationFiled: April 7, 2014Publication date: April 27, 2017Inventors: Eric OSWALD, Patricia MARTIN, Kazunori MURASE
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Patent number: 9157010Abstract: A magnetorheological fluid for use in magnetorheological ultrasmooth polishing of a substrate surface, comprising an aqueous carrier vehicle; a first amount of magnetic particles having a average diameter between about 1 micrometer and about 2 micrometers; and a second amount of abrasive particles having an average diameter between about <1 nanometer and about 15 nanometers. The fluid may further comprise a chemical stabilizer. Preferably the size of the magnetic particles is 2 to 3 orders of magnitude greater than the size of the abrasive particles. Preferably, the magnetic particles are spherical and include carbonyl iron, and preferably, the abrasive particles are selected from the group consisting of aluminum oxide, zirconium oxide, cerium oxide, silica, boron carbide, silicon carbide, natural diamond, synthetic diamond, and combinations thereof.Type: GrantFiled: July 18, 2012Date of Patent: October 13, 2015Assignee: Cabot Microelectronics CorporationInventors: William Kordonski, Sergei Gorodkin, Eric Oswald
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Publication number: 20140020305Abstract: A magnetorheological fluid for use in magnetorheological ultrasmooth polishing of a substrate surface, comprising an aqueous carrier vehicle; a first amount of magnetic particles having a average diameter between about 1 micrometer and about 2 micrometers; and a second amount of abrasive particles having an average diameter between about <1 nanometer and about 15 nanometers. The fluid may further comprise a chemical stabilizer. Preferably the size of the magnetic particles is 2 to 3 orders of magnitude greater than the size of the abrasive particles. Preferably, the magnetic particles are spherical and include carbonyl iron, and preferably, the abrasive particles are selected from the group consisting of aluminum oxide, zirconium oxide, cerium oxide, silica, boron carbide, silicon carbide, natural diamond, synthetic diamond, and combinations thereof.Type: ApplicationFiled: July 18, 2012Publication date: January 23, 2014Inventors: William KORDONSKI, Sergei GORODKIN, Eric OSWALD
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Patent number: 8277798Abstract: The present invention relates to the use of cells containing in their genome a specific DNA molecule, as cytopathic agents able to inhibit the proliferation of cells, when these proliferative cells are contacted with the cells containing the above-mentioned DNA molecule.Type: GrantFiled: May 10, 2007Date of Patent: October 2, 2012Assignees: Institut National de la Recherche Agronomique, Bayerische Julius-Maximilians-Universitat WurzburgInventors: Eric Oswald, Jörg Hacker, Jean Philippe Nougayrede, Ulrich Dobrindt, Frédéric Taieb, Fabrice Pierre
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Patent number: 7696095Abstract: The present invention provides auto-stopping CMP slurry compositions that minimize post-CMP non-uniformity and also extend the time that polishing can be continued beyond the end point without the risk of over-polishing the dielectric silicon dioxide film. Auto-stopping CMP slurry compositions according to the invention include ceria abrasive particles and an effective amount of a polyalkylamine such as polyethyleneimine dispersed in water. The methods of the invention include polishing a topographic dielectric silicon dioxide film layer using the auto-stopping CMP slurry compositions to obtain a dielectric silicon dioxide surface having a desired predetermined minimum step height.Type: GrantFiled: February 23, 2007Date of Patent: April 13, 2010Assignee: Ferro CorporationInventors: Eric Oswald, Sean Frink, Bradley Kraft, Brian Santora
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Publication number: 20090238804Abstract: The present invention relates to the use of cells containing in their genome a specific DNA molecule, as cytopathic agents able to inhibit the proliferation of cells, when these proliferative cells are contacted with the cells containing the above-mentioned DNA molecule.Type: ApplicationFiled: May 10, 2007Publication date: September 24, 2009Applicant: INSTITUT NATIONAL DE LA RECHERCHE AGRONOMIQUEInventors: Eric Oswald, Jörg Hacker, Jean Philippe Nougayrede, Ulrich Dobrindt, Frederic Taieb, Fabrice Pierre
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Publication number: 20080202037Abstract: The present invention provides auto-stopping CMP slurry compositions that minimize post-CMP non-uniformity and also extend the time that polishing can be continued beyond the end point without the risk of over-polishing the dielectric silicon dioxide film. Auto-stopping CMP slurry compositions according to the invention include ceria abrasive particles and an effective amount of a polyalkylamine such as polyethyleneimine dispersed in water. The methods of the invention include polishing a topographic dielectric silicon dioxide film layer using the auto-stopping CMP slurry compositions to obtain a dielectric silicon dioxide surface having a desired predetermined minimum step height.Type: ApplicationFiled: February 23, 2007Publication date: August 28, 2008Applicant: FERRO CORPORATIONInventors: Eric Oswald, Sean Frink, Bradley Kraft, Brian Santora
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Publication number: 20060216935Abstract: The present invention provides an oxide CMP slurry composition for use in planarizing silicon oxide-containing films via CMP during CMOS device fabrication, and a method of planarizing silicon oxide-containing films via CMP using the slurry composition. The oxide CMP slurry composition according to the invention includes: (i) proline, lysine and/or arginine; (ii) a pyrrolidone compound; and (iii) abrasive particles. Proline is presently most preferred for use in the invention. In the STI sub-process of the CMOS device fabrication process, the oxide CMP slurry composition according to the present invention acts to aggressively remove only the silicon dioxide overburden on the processed wafer that is in contact with a polishing pad, which results in the formation of a substantially planar, defect-free surface.Type: ApplicationFiled: March 28, 2005Publication date: September 28, 2006Applicant: Ferro CorporationInventors: Eric Oswald, Yue Liu
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Patent number: 6616514Abstract: The present invention provides a chemical mechanical polishing slurry for use in removing a first substance from a surface of an article in preference to silicon nitride by chemical mechanical polishing. The chemical mechanical polishing slurry according to the invention includes an abrasive, an aqueous medium, and an organic polyol that does not dissociate protons, said organic polyol including a compound having at least three hydroxyl groups that are not dissociable in the aqueous medium, or a polymer formed from at least one monomer having at least three hydroxyl groups that are not dissociable in the aqueous medium. In the preferred embodiment, ceria particles are used as the abrasive and the organic polyol is selected from the group consisting of mannitol, sorbitol, mannose, xylitol, sorbose, sucrose, and dextrin. The chemical mechanical polishing slurry can further optionally include acids or bases for adjusting the pH within an effective range of from about 2 to about 12.Type: GrantFiled: June 3, 2002Date of Patent: September 9, 2003Assignee: Ferro CorporationInventors: Brian Edelbach, Eric Oswald, Yie-Shein Her