Abstract: A method includes receiving, by a computer, a destination address. The computer can obtain historical fulfillment data for the destination address. The computer can then determine one or more temporary transporter locations based on the historical fulfillment data for the destination address. The computer can determine a waypoint location from the one or more temporary transporter locations. The computer can provide the waypoint location.

Abstract: The present disclosure provides a vehicle component comprising: at least two movable blades; and an actuator receiving an activation signal and driving at least one of the blades to move between a first position and a second position to exhibit a particular action. The present disclosure also provides a control method of the vehicle component, wherein the component comprises at least two movable blades. The control method comprises: driving the blade of the vehicle component to move between a first position and a second position based on an activation signal to exhibit a particular action. According to the present disclosure, the component and the control method thereof can meet people's demand for producing attractive visual effects with customized actions or patterns, and bring better vehicle use experience.

Abstract: An apparatus, spread spectrum receiver, and method of controlling a circular buffer, comprising a circular buffer and a controller coupled thereto. The circular buffer receives first data at a first data rate and second data at a second data rate. The controller determines a first range in the circular buffer based on the first data rate and a first time difference between the first write and first read speed, accesses the first data in the first range, estimates a second range in the circular buffer based on the second data rate and a second time difference between the first write and first read speed, and accesses the second data in the second range, where the second range is larger than and partially covered by the first range.

Abstract: A mechanism is disclosed for imposing a delay on a variable rate information stream. A stream of information sets is received, where the stream has a variable information rate that can change from time period to time period. In a first time period, information sets are stored into a first buffer. In a second time period, information sets are stored into a second buffer. Because of the variable information rate, the number of information sets stored into the first and second buffers may differ. After a delay period has elapsed since the beginning of the first time period, the information sets in the first buffer are outputted. After a delay period has elapsed since the beginning of the second time period, the information sets in the second buffer are outputted. In this manner, a consistent delay is imposed on the information sets regardless of the information rate of the stream.

Abstract: In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

Abstract: A mechanism is disclosed for imposing a delay on a variable rate information stream. A stream of information sets is received, where the stream has a variable information rate that can change from time period to time period. In a first time period, information sets are stored into a first buffer. In a second time period, information sets are stored into a second buffer. Because of the variable information rate, the number of information sets stored into the first and second buffers may differ. After a delay period has elapsed since the beginning of the first time period, the information sets in the first buffer are outputted. After a delay period has elapsed since the beginning of the second time period, the information sets in the second buffer are outputted. In this manner, a consistent delay is imposed on the information sets regardless of the information rate of the stream.

Abstract: An apparatus, spread spectrum receiver, and method of controlling a circular buffer, comprising a circular buffer and a controller coupled thereto. The circular buffer receives first data at a first data rate and second data at a second data rate. The controller determines a first range in the circular buffer based on the first data rate and a first time difference between the first write and first read speed, accesses the first data in the first range, estimates a second range in the circular buffer based on the second data rate and a second time difference between the first write and first read speed, and accesses the second data in the second range, where the second range is larger than and partially covered by the first range.

Abstract: According to an embodiment of the invention, an adjustable EUV light source may be used for photolithography. The EUV light source, such as an electrode, is mounted in an adjustable housing. The housing can be adjusted to change the distance between the light source and focusing mirrors, which in turn changes the partial coherence value of the system. The partial coherence value can be changed to print different types of semiconductor features.

Abstract: A detector for extreme ultraviolet (EUV) energy uses incidence reflectance of the EUV beam off the detector to both capture a small but controllable fraction of the EUV energy and to redirect most of the energy to its target. In one embodiment, a reflective coating of material on a sensor surface is used. In another embodiment, a multi-layer reflector on a sensor is used. A method of making the multi-layer reflector/sensor is also described.

Abstract: According to a first embodiment of the invention, a dual cathode electrode for generating EUV light is disclosed. The dual cathode electrode may include a first outer cathode, a second inner cathode, and an anode disposed between the inner and outer cathodes. The dual cathode electrode also includes a plasma disposed in between the cathodes that emits EUV photons when it is excited by an arc between the anode and the cathodes. According to a second embodiment of the invention, several Dense Plasma Focus (DPF) electrodes are placed along a circle. The DPF electrodes, when activated, will emit electron photons from the circle in which they are placed thereby avoiding obscuration used to protect UV mirrors against debris.

Abstract: In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

Abstract: In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

Abstract: According to a first embodiment of the invention, a dual cathode electrode for generating EUV light is disclosed. The dual cathode electrode may include a first outer cathode, a second inner cathode, and an anode disposed between the inner and outer cathodes. The dual cathode electrode also includes a plasma disposed in between the cathodes that emits EUV photons when it is excited by an arc between the anode and the cathodes. According to a second embodiment of the invention, several Dense Plasma Focus (DPF) electrodes are placed along a circle. The DPF electrodes, when activated, will emit electron photons from the circle in which they are placed thereby avoiding obscuration used to protect UV mirrors against debris.

Abstract: According to an embodiment of the invention, an adjustable EUV light source may be used for photolithography. The EUV light source, such as an electrode, is mounted in an adjustable housing. The housing can be adjusted to change the distance between the light source and focusing mirrors, which in turn changes the partial coherence value of the system. The partial coherence value can be changed to print different types of semiconductor features.

Abstract: In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

Abstract: A detector for extreme ultraviolet (EUV) energy uses incidence reflectance of the EUV beam off the detector to both capture a small but controllable fraction of the EUV energy and to redirect most of the energy to its target. In one embodiment, a reflective coating of material on a sensor surface is used. In another embodiment, a multi-layer reflector on a sensor is used. A method of making the multi-layer reflector/sensor is also described.