Patents by Inventor Eric Petrus HOGERVORST

Eric Petrus HOGERVORST has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230154719
    Abstract: The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.
    Type: Application
    Filed: January 17, 2023
    Publication date: May 18, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Laura DINU-GURTLER, Eric Petrus HOGERVORST, Jurgen VAN SOEST
  • Patent number: 11557455
    Abstract: The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.
    Type: Grant
    Filed: October 11, 2019
    Date of Patent: January 17, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Laura Dinu-Gurtler, Eric Petrus Hogervorst, Jurgen Van Soest
  • Patent number: 10622188
    Abstract: The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
    Type: Grant
    Filed: July 7, 2016
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Laura Dinu-Gürtler, Eric Petrus Hogervorst
  • Publication number: 20200043693
    Abstract: The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.
    Type: Application
    Filed: October 11, 2019
    Publication date: February 6, 2020
    Inventors: Laura DINU-GURTLER, Eric Petrus HOGERVORST, Jurgen VAN SOEST
  • Publication number: 20160314935
    Abstract: The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
    Type: Application
    Filed: July 7, 2016
    Publication date: October 27, 2016
    Inventors: Laura DINU-GÜRTLER, Eric Petrus HOGERVORST
  • Patent number: 9466453
    Abstract: The invention relates to a cathode arrangement comprising: a cathode body housing an emission surface for emitting electrons in a longitudinal direction, wherein the emission surface is bounded by an emission perimeter; a focusing electrode at least partially enclosing the cathode body in a transversal direction and comprising an electron transmission aperture for focusing the electrons emitted by the emission surface, wherein the aperture is bounded by an aperture perimeter, wherein the cathode body is moveably arranged within the focusing electrode over a maximum transversal distance from an aligned position, and wherein the aperture perimeter transversally extends over the emission surface and beyond the emission perimeter over an overlap distance that exceeds the maximum transversal distance.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: October 11, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Laura Dinu-Gürtler, Eric Petrus Hogervorst
  • Patent number: 9455112
    Abstract: The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: September 27, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Laura Dinu-Gürtler, Eric Petrus Hogervorst
  • Publication number: 20150187541
    Abstract: The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
    Type: Application
    Filed: December 22, 2014
    Publication date: July 2, 2015
    Inventors: Laura DINU-GÜRTLER, Eric Petrus HOGERVORST
  • Publication number: 20150187533
    Abstract: The invention relates to a cathode arrangement comprising: a cathode body housing an emission surface for emitting electrons in a longitudinal direction, wherein the emission surface is bounded by an emission perimeter; a focusing electrode at least partially enclosing the cathode body in a transversal direction and comprising an electron transmission aperture for focusing the electrons emitted by the emission surface, wherein the aperture is bounded by an aperture perimeter, wherein the cathode body is moveably arranged within the focusing electrode over a maximum transversal distance from an aligned position, and wherein the aperture perimeter transversally extends over the emission surface and beyond the emission perimeter over an overlap distance that exceeds the maximum transversal distance.
    Type: Application
    Filed: December 22, 2014
    Publication date: July 2, 2015
    Inventors: Laura DINU-GÜRTLER, Eric Petrus HOGERVORST