Abstract: A data analysis system presents a user interface to allow a user to provide a natural language query pertaining to a dataset, wherein the dataset is associated with a data object model comprising a plurality of objects and receives, via the user interface, user input specifying the natural language query. The data analysis system further modifies, in the user interface, the user input to visually indicate one or more portions of the natural language query that each represent one of the plurality of objects and presents, in the user interface, a response to the natural language query, the response being based on data from the dataset, the data corresponding to the one of the plurality of objects.

Abstract: A data analysis system receives a data string comprising a natural language query pertaining to a dataset, wherein the dataset is associated with a data object model comprising a plurality of objects, and parses the data string to identify a plurality of individual words within the data string. The data analysis system identifies, based on the plurality of individual words, one or more objects of the plurality of objects, wherein the one or more objects are associated with the natural language query in the data string. The data analysis system further determines one or more artifacts that are based on the dataset, wherein each of the one or more artifacts is associated with one of the one or more objects and provides a response to the natural language query.

Abstract: A user interface for working through workflows can include a dual-region approach. The first display region can display a series of workflows that an assigned worker (“assignee”) may have. Each of the workflows can have one or more tasks associated therewith. Each workflow and/or task can be associated with one or more triggers that initiate the assignment of that workflow and/or task. In response to selection of a workflow or task, the second display region can display information associated with the workflow or task.

Abstract: A user interface for working through workflows can include a dual-region approach. The first display region can display a series of workflows that an assigned worker (“assignee”) may have. Each of the workflows can have one or more tasks associated therewith. Each workflow and/or task can be associated with one or more triggers that initiate the assignment of that workflow and/or task. In response to selection of a workflow or task, the second display region can display information associated with the workflow or task.

Abstract: A training apparel or arrangement for weight training including a main body extending from a first end to a second end, at least one attachment portion provided on the main body and configured to secure the main body to an individual's limb, at least one pocket provided on the main body, and at least one insert at least partially insertable into the at least one pocket of the main body and shaped to form around the individual's limb. The at least one insert may provide added weight to the training apparel to assist in dynamic weight training activities performed by the individual. A method of using a training apparel for dynamic weight training is also disclosed.

Abstract: A method of packaging a dynamically linked computer program function comprising: establishing an attribute, each attribute exhibiting a plurality of at least one of variations, characteristics and parameters associated with the dynamically linked computer program function; obtaining a source file associated with the dynamically linked computer program function; and compiling and linking the source file to create an executable file based on the at least one of variations, characteristics, and parameters for each attribute. The executable file is configured to facilitate choice of a selected version of the function based on a particular at least one of variations, characteristics, and parameters for each attribute.

Abstract: A high deposition rate sputter method is utilized to produce bulk, single-crystal, low-defect density Group III nitride materials suitable for microelectronic and optoelectronic devices and as substrates for subsequent epitaxy, and to produce highly oriented polycrystalline windows. A template material having an epitaxial-initiating growth surface is provided. A Group III metal target is sputtered in a plasma-enhanced environment using a sputtering apparatus comprising a non-thermionic electron/plasma injector assembly, thereby to producing a Group III metal source vapor. The Group III metal source vapor is combined with a nitrogen-containing gas to produce a reactant vapor species comprising Group III metal and nitrogen. The reactant vapor species is deposited on the growth surface to produce a single-crystal MIIIN layer thereon. The template material is removed, thereby providing a free-standing, single-crystal MIIIN article having a diameter of approximately 0.

Abstract: A method utilizes sputter transport techniques to produce arrays or layers of self-forming, self-oriented columnar structures characterized as discrete, single-crystal Group III nitride posts or columns on various substrates. The columnar structure is formed in a single growth step, and therefore does not require processing steps for depositing, patterning, and etching growth masks. A Group III metal source vapor is produced by sputtering a target, for combination with nitrogen supplied from a nitrogen-containing source gas. The III/V ratio is adjusted or controlled to create a Group III metal-rich environment within the reaction chamber conducive to preferential column growth. The reactant vapor species are deposited on the growth surface to produce single-crystal MIIIN columns thereon. The columns can be employed as a strain-relieving platform for the growth of continuous, low defect-density, bulk materials.

Abstract: A high deposition rate sputter method is utilized to produce bulk, single-crystal, low-defect density Group IIl nitride materials suitable for microelectronic and optoelectronic devices and as substrates for subsequent epitaxy, and to produce highly oriented polycrystalline windows. A template material having an epitaxial-initiating growth surface is provided. A Group III metal target is sputtered in a plasma-enhanced environment using a sputtering apparatus comprising a non-thermionic electron/plasma injector assembly, thereby to producing a Group III metal source vapor. The Group III metal source vapor is combined with a nitrogen-containing gas to produce a reactant vapor species comprising Group III metal and nitrogen. The reactant vapor species is deposited on the growth surface to produce a single-crystal MIIIN layer thereon. The template material is removed, thereby providing a free-standing, single-crystal MIIIN article having a diameter of approximately 0.

Abstract: A method utilizes sputter transport techniques to produce arrays or layers of self-forming, self-oriented columnar structures characterized as discrete, single-crystal Group III nitride posts or columns on various substrates. The columnar structure is formed in a single growth step, and therefore does not require processing steps for depositing, patterning, and etching growth masks. A Group III metal source vapor is produced by sputtering a target, for combination with nitrogen supplied from a nitrogen-containing source gas. The III/V ratio is adjusted or controlled to create a Group III metal-rich environment within the reaction chamber conducive to preferential column growth. The reactant vapor species are deposited on the growth surface to produce single-crystal MIIIN columns thereon. The columns can be employed as a strain-relieving platform for the growth of continuous, low defect-density, bulk materials.