Abstract: An assembly includes a temperature sensor having an operating range that includes a normal operating temperature of a cryogenic vacuum pump and a temperature of the pump following a dump. The assembly may be included in a semiconductor processing apparatus for performing an implant operation on a wafer. The apparatus includes: a chamber containing a wafer; an ion source that provides ions to be implanted in the wafer; a cryogenic vacuum pump that maintains a vacuum in the chamber; and a temperature sensor having an operating range that includes a normal operating temperature of the pump and a temperature of the pump following a dump. A circular mounting bracket may be used to mount the temperature sensor on an exterior surface of the pump. An alarm may be activated when the sensed temperature indicates that a dump condition exists. An inert gas, such as nitrogen, may be introduced into the semiconductor wafer processing apparatus when the sensed temperature indicates that a dump condition exists.