Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a coated metallic substrate.

Abstract: A coated metallic substrate including at least a first coating consisting of aluminum is provided. The first coating has a thickness between 1.0 and 4.5 ?m and is directly topped by a second coating based on zinc, such second coating having a thickness between 1.5 and 9.0 ?m. The thickness ratio of the first coating with respect to the second coating is between 0.2 and 1.2.

Abstract: A coated substrate obtainable by a method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber. A vacuum deposition facility for producing such coated substrates.

Abstract: A method for the fabrication of a coated sheet is provided. The method includes the steps of providing a sheet in a deposition chamber, maintaining the deposition chamber at a pressure Pchamber, maintaining an ejection chamber that is located inside the deposition chamber at a pressure Peject and coating the sheet with zinc with a sonic vapor jet. A ratio of the pressures Pchamber to Peject is between 2·10?3 and 5.5·10?2.

Abstract: A method for managing the gloss of an organic coating formed on a moving strip on a coil-coating line, the method including the steps of: 1) Setting a set gloss value Gs, a set gloss range Rs and a proportionality constant K of a predefined linear mathematical relation between the temperature of the wet film before UV curing and the gloss, 2) Collecting the measure of the temperature T of the wet film in at least a width portion of the moving strip upstream of the UV curing device and collecting the measure of the gloss G, 3) Correcting a deviation of the measured gloss G beyond Rs, this step including a sub-step of calculating the corrected temperature Tc to be reached by the wet film in the width portion upstream of the UV curing device according to equation: Tc=T+K(G?Gs).

Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a coated metallic substrate.

Abstract: A coated substrate obtainable by a method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber. A vacuum deposition facility for producing such coated substrates.

Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including: a central casing including a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap including at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.

Abstract: A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the substrate S run through along a given path P and a vapor jet coater 3 linking the evaporation pipe to the deposition chamber, wherein the vapor jet coater further includes a repartition chamber 31 including at least one reheater 33 positioned within the repartition chamber and a vapor outlet orifice 32 including a base opening linking the vapor outlet orifice to the repartition chamber, a top opening through which the vapor can exit in the deposition chamber and two sides converging toward each other in the direction of the top opening.

Abstract: A method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a vacuum deposition facility.

Abstract: A method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal and a vacuum deposition facility for the method for continuously depositing on a running substrate.

Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes: a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.

Abstract: A coated metallic substrate including at least a first coating of aluminum, such first coating having a thickness below 5 ?m and being directly topped by a second coating including from 0.5 to 5.9% by weight of magnesium, the balance being zinc.

Abstract: A steel sheet is provided with a coating having at least one layer of zinc and a top layer of paint applied by cataphoresis. The zinc layer is deposited by a jet vapor deposition process in a deposition chamber maintained at a pressure between 6·10?2 mbar and 2·10?1 mbar. A fabrication method and an installation are also provided.

Abstract: A steel sheet is provided with a coating having at least one layer of zinc and a top layer of paint applied by cataphoresis. The zinc layer is deposited by a jet vapor deposition process in a deposition chamber maintained at a pressure between 6·10?2 mbar and 2·10?1 mbar. A fabrication method and an installation are also provided.

Abstract: A Method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber; a substrate coated with at least one metal on both sides of the substrate having an average thickness, wherein the coating is deposited homogenously such that the maximum thickness of the coating can exceed the average thickness of 15% maximum. A vacuum deposition facility also is provided.

Abstract: A method for fabricating a substrate provided with a plurality of layers, includes: providing a steel substrate with an oxide layer including metal oxides on the steel substrate; providing a metal coating layer directly on the oxide layer, the metal coating layer including: at least 8% by weight nickel; at least 10% by weight chromium; and a remainder being iron and impurities from a fabrication process; and providing an anti-corrosion coating layer directly on the metal coating layer.

Abstract: The invention relates to a vapour generator for the deposition of a metal coating onto a substrate (7), preferably a steel strip, that comprises a vacuum chamber (6) in the form of a housing including a vapour deposition head or ejector (3) in tight communication via a supply duct (4) with at least one crucible (1) containing the coating metal in a liquid form and located outside the vacuum chamber (6), characterised in that the ejector (3) includes a longitudinal slot for the vapour outlet acting as a sonic throat and extending on the entire width of the substrate (7), a filtration medium or a charge loss member (3A) made of a sintered material being provided in the ejector immediately before said slot on the vapour path in order to equalise the flow speed of the vapour exiting the ejector (3) through the sonic throat.

Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.

Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.