Abstract: A Z-rotary wafer positioning stage includes a stationary unit, a Z-unit actuatable upwardly and downwardly relative to the stationary unit, a rotary unit having a wafer chuck rotatably mounted in the Z-unit, a rotary motor for rotating the rotary unit relative to the Z-unit, and a lift-pin mechanism including lift-pins aligned with through-holes extending through the wafer chuck. The lift-pin mechanism can be toggled between a first position, in which the distal ends of the lift-pins are below or at the level of the wafer chuck surface, and a second position, in which the distal ends of the lift-pins extend above the wafer chuck surface. The Z-rotary wafer positioning stage includes upper magnet(s) and lower magnet(s) to hold the lift-pin mechanism in the first position and second position, respectively, and electromagnet(s) configured to be energized to toggle the lift-pin mechanism between the first and second positions.

Abstract: A Z-rotary wafer positioning stage includes a stationary unit, a Z-unit actuatable upwardly and downwardly relative to the stationary unit, a rotary unit having a wafer chuck rotatably mounted in the Z-unit, a rotary motor for rotating the rotary unit relative to the Z-unit, and a lift-pin mechanism including lift-pins aligned with through-holes extending through the wafer chuck. The lift-pin mechanism can be toggled between a first position, in which the distal ends of the lift-pins are below or at the level of the wafer chuck surface, and a second position, in which the distal ends of the lift-pins extend above the wafer chuck surface. The Z-rotary wafer positioning stage includes upper magnet(s) and lower magnet(s) to hold the lift-pin mechanism in the first position and second position, respectively, and electromagnet(s) configured to be energized to toggle the lift-pin mechanism between the first and second positions.