Abstract: A magnetic media structure 200 deposited on glass substrates without a NiP layer having oriented media (ORMRT>1), high coercivity and high SMNR is presented. This media will significantly reduce the cost of making high quality media on glass substrates by eliminating the cost associated with additional steps of depositing a NiP layer and texturing that layer. First glass substrates are mechanically textured to have a surface roughness of about 1 Å to about 12 Å. The first layer of the magnetic structure contains Cr and Ti with a Ti content of 27 to 63 atomic percentage. The second layer contains Co and Ti with a Ti content of 43 to 55 atomic percentage. The third layer is a Cr-alloy layer wherein the alloy is an element chosen from W, Mo, V, Si, Ti, Mn, Ru, B, Nb, Ta, Zr, and Pt. The fourth layer is Co58Cr37Pt5 and the fifth layer is Co61Cr15Pt12B12. Finally, the protective overcoat is typically a hard material that contains hydrogenated carbon.

Abstract: A magnetic media structure 200 deposited on glass substrates without a NiP layer having oriented media (ORMRT>1), high coercivity and high SMNR is presented. This media will significantly reduce the cost of making high quality media on glass substrates by eliminating the cost associated with additional steps of depositing a NiP layer and texturing that layer. First glass substrates are mechanically textured to have a surface roughness of about 1 Å to about 12 Å. The first layer of the magnetic structure contains Cr and Ti with a Ti content of 27 to 63 atomic percentage. The second layer contains Co and Ti with a Ti content of 43 to 55 atomic percentage. The third layer is a Cr-alloy layer wherein the alloy is an element chosen from W, Mo, V, Si, Ti, Mn, Ru, B, Nb, Ta, Zr, and Pt. The fourth layer is Co58Cr37Pt5 and the fifth layer is Co61Cr15Pt12B12. Finally, the protective overcoat is typically a hard material that contains hydrogenated carbon.

Abstract: Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a pad and polishing tape combination in contact with a rotating and oscillating disk surface to completely remove the random scratches previously formed by a polishing step. The apparatus facilitates the application of a specially designed, extremely fine alumina slurry composition without producing similar size circumferential scratches at the high surface speeds.

Abstract: Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a pad and polishing tape combination in contact with a rotating and oscillating disk surface to completely remove the random scratches previously formed by a polishing step. The apparatus facilitates the application of a specially designed, extremely fine alumina slurry composition without producing similar size circumferential scratches at the high surface speeds.

Abstract: Method for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a large surface pad and polishing tape combination while in contact with a rotating disk surface that is also moving in a circumferential direction to completely remove the random scratches previously formed by a polishing step. The scratches are removed with the aid of a specially designed, extremely fine alumina slurry composition which prevent producing similar size circumferential scratches at the high surface speeds. The methodology provides for a smoother disk surface than prior known super-polish/texture methodologies.