Abstract: A method and apparatus for data analysis according to various aspects of the present invention is configured to automatically identify a characteristic of a fabrication process for components based on test data for the components.

Abstract: A method and apparatus for testing semiconductors according to various aspects of the present invention comprises a test system comprising composite data analysis element configured to analyze data from more than one dataset. The test system may be configured to provide the data in an output report. The composite data analysis element suitably performs a spatial analysis to identify patterns and irregularities in the composite data set. The composite data analysis element may also operate in conjunction with a various other analysis systems, such as a cluster detection system and an exclusion system, to refine the composite data analysis. The composite may also be merged into other data.

Abstract: A method and apparatus for data analysis according to various aspects of the present invention is configured to identify statistical outliers in test data for components, including local outliers representing outliers within subsets of larger data populations.