Patents by Inventor Eric Willem Felix Casimiri

Eric Willem Felix Casimiri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing a membrane assembly
    Patent number: 10712656
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Zomer Silvester Houweling, Eric Willem Felix Casimiri, Tamara Druzhinina, Paul Janssen, Michael Alfred Josephus Kuijken, Martinus Hendrikus Antonius Leenders, Sicco Oosterhoff, Mária Péter, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen
  • METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY
    Publication number: 20180239240
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
    Type: Application
    Filed: August 26, 2016
    Publication date: August 23, 2018
    Inventors: Zomer Silvester HOUWELING, Eric Willem Felix CASIMIRI, Tamara DRUZHININA, JANSSEN Paul, Michael Alfred Josephus KUIJKEN, Martinus Hendrikus Antonius LEENDERS, Sicco OOSTERHOFF, Mária PÉTER, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Beatrijs Louise Marie-Joseph Katrie VERBRUGGE, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN
  • Apparatus, a device and a device manufacturing method
    Patent number: 9778574
    Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: October 3, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Catharina Reinier Derks, Eric Willem Felix Casimiri, Marcel Mathijs Theodore Dierichs, Sumant Sukdew Ramanujan Oemrawsingh, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Johannes Fransiscus Maria Velthuis, Alexander Nikolov Zdravkov, Wassim Zein Eddine
  • An Apparatus, a Device and a Device Manufacturing Method
    Publication number: 20160282723
    Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.
    Type: Application
    Filed: November 4, 2014
    Publication date: September 29, 2016
    Applicant: ASML Nethrlands B.V.
    Inventors: Sander Catharina Reinier DERKS, Eric Willem Felix CASIMIRI, Marcel Mathijs Theodore DIERICHS, Sumant Sukdew Ramanujan OEMRAWSINGH, Wilhelmus Theodorus Anthonius VAN DEN EINDEN, Johannes Fransiscus Maria VELTHUIS, Alexander Nikolov ZDRAVKOV, Wassim ZEIN EDDINE
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 8564757
    Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: October 22, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Bauke Jansen, Richard Joseph Bruls, Hans Jansen, Antonius Johannus Van der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Eric Willem Felix Casimiri
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20100328634
    Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.
    Type: Application
    Filed: May 12, 2010
    Publication date: December 30, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Bauke Jansen, Richard Joseph Bruls, Hans Jansen, Antonius Johannus Van der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Eric Willem Felix Casimiri