Patents by Inventor Erica R. Porras

Erica R. Porras has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7984891
    Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
    Type: Grant
    Filed: April 20, 2007
    Date of Patent: July 26, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Michael J. DeChellis, Chris Melcer, Erica R. Porras, Aneesh Khullar, Balarabe N. Mohammed
  • Patent number: 7935948
    Abstract: An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.
    Type: Grant
    Filed: March 26, 2007
    Date of Patent: May 3, 2011
    Assignee: Sokudo Co., Ltd.
    Inventors: Erica R. Porras, Natarajan Ramanan
  • Publication number: 20090039057
    Abstract: A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
    Type: Application
    Filed: October 14, 2008
    Publication date: February 12, 2009
    Inventors: Mark Crockett, John W. Lane, Micahel J. DeChellis, Chris Melcer, Erica R. Porras, Aneesh Khullar, Balarabe N. Mohammed
  • Publication number: 20080035666
    Abstract: An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.
    Type: Application
    Filed: March 26, 2007
    Publication date: February 14, 2008
    Applicant: SOKUDO CO., LTD.
    Inventors: Erica R. Porras, Natarajan Ramanan
  • Publication number: 20040119038
    Abstract: The disclosure pertains to a space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The present invention also pertains to an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
    Type: Application
    Filed: July 12, 2003
    Publication date: June 24, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Mark Crockett, John W. Lane, Michael J. DeChellis, Chris Melcer, Erica R. Porras, Aneesh Khullar, Balarabe N. Mohammed