Abstract: A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The apparatus has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.

Abstract: A discharge vessel with an excimer fill comprises a cap, electrodes and a fill having at least one noble gas and a halogen, which, when the lamp is operating, together form an excimer, the discharge vessel being manufactured from quartz glass. The inner wall of the discharge vessel is completely covered with a passivation layer of a metal oxide of the metals Al, Hf, Y or Sc or the mixed oxides thereof, the layer having an amorphous structure and its layer thickness being 20 to 200 nm.

Abstract: For the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments—especially radicals or ions—are produced by ultraviolet radiation; the ultraviolet radiation is performed by at least one ultraviolet radiator disposed at a given distance, with a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, which is provided on the side facing away from the discharge chamber with at least one electrode; during the irradiation a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated.

Abstract: A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The radiator has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.

Abstract: A method and an apparatus for phototherapy or tanning of the human body utilizes energy most efficiently by generating incoherent excimer radiation in the wavelength bands of between 300 and 310 nm, preferably about 308 nm, and from 315 to 350 nm. A discharge space (4) is defined by a discharge vessel (3) of radiation transmissive dielectric material. A first electrode (5), preferably a mesh or a net jacket, surrounds the wall of the discharge vessel; a second electrode (7) covered by a second dielectric (8) is coaxially located within the discharge vessel. A fill of xenon halide, preferably xenon chloride with a cold-fill pressure of about 500 to 1,500 mbar is located within a discharge space (4). A voltage source (15) is connected to said first and second electrodes.