Abstract: The invention relates to a monochromator on the basis of Wien filters. According to a first aspect, four Wien filters are arranged in series along a common optical axis of which the two center Wien filters are each rotated by 90° relative to the two outer Wien filters. The two center Wien filters (W2, W3) are orientated simultaneously anti-parallel to each other. Such a monochromator has inherent stigmatic imaging characteristics and is, as a unit, free of dispersion. According to a further aspect, each of the Wien filters is configured symmetrically with reference to a 90° rotation about the optical axis. The magnetic and the electrostatic poles of the Wien filter are identically dimensioned so that the orientation of the Wien filter azimuthally about the optical axis (OA) can be varied by a corresponding drive of the particular contacts for the voltage supply and current supply of the electrodes and coils.

Abstract: The invention relates to a monochromator on the basis of Wien filters. According to a first aspect, four Wien filters are arranged in series along a common optical axis of which the two center Wien filters are each rotated by 90° relative to the two outer Wien filters. The two center Wien filters (W2, W3) are orientated simultaneously anti-parallel to each other. Such a monochromator has inherent stigmatic imaging characteristics and is, as a unit, free of dispersion. According to a further aspect, each of the Wien filters is configured symmetrically with reference to a 90° rotation about the optical axis. The magnetic and the electrostatic poles of the Wien filter are identically dimensioned so that the orientation of the Wien filter azimuthally about the optical axis (OA) can be varied by a corresponding drive of the particular contacts for the voltage supply and current supply of the electrodes and coils.

Abstract: An antenna for nuclear magnetic resonance tomography has at least one annulus antenna surrounded by a passive layer of superconductor material, so that an optimally uniform magnetic field and an optimally high signal-to-noise ratio are assured during operation.

Abstract: Purely electrical or magnetic deflection systems are usually utilized in the probe-shaping part of modern electron beam tomographs in order to remove the gas ions generated in the evacuated drift tube by electron impact from the beam. The known deflection systems, however, cause an offset of the electron beam, so that this enters extra-axially into the lens element following the deflection system. In the apparatus for removing ions from an electron beam disclosed herein, a deflection unit (Wien filter) generates an E.times.B field oriented perpendicular to the beam axis that exerts strong shearing forces only on the positively charged gas ions, but does not influence the electrons. The deflection unit is essentially composed of two tube electrodes lying at a constant potential, of an electrostatic octopole deflector, and two saddle coil pairs annularly surrounding the octopole deflector. The apparatus is useful for fast electron beam tomographs, including x-ray scanners.

Abstract: Objective lens for producing a radiation focus in the inside of a specimen. Many laser measuring methods for sensing charge carrier density or the distribution of a potential in the inside of an integrated circuit (IC) of microelectronics are based on what is referred to as "backside-probing" technique, whereby the laser radiation (LA) is focused into the plane of the voltage-carrying components (SK) from the backside of the component using a conventional microscope objective. Since the irradiation occurs through the substrate (SU), a pronounced spherical aberration arises that limits the spatial resolution to approximately 2 through 4 .mu.m. For producing a sub-.mu. probe in the substrate (SU), a lens is arranged on the polished backside (RS) of the integrated circuit (IC), this lens being composed of a silicon base plate (GP, refractive index of n.sub.1), a sphere (KU, refractive index of n.sub.2 <n.sub.1, radius of r.sub.

Abstract: Particle beam apparatus for improving the spatial resolution of a conventional scanning electron microscope given low electron energies and adequately great working distances, an electrostatic immersion lens is arranged in the region of an intermediate image generated by a condenser unit. The immersion lens is composed of a beam-guiding tube that is at an anode potential and of a further tube electrode that is arranged and insulated in the column of the scanning electron microscope and is charged with a high positive potential. Since the tube electrode extends into the region of the pole piece gap of the objective lens, an electrical field that decelerates the electrons to the desired ultimate energy is built up at this location. Due to the retarding field overlaid on the focusing magnetic field of the objective lens, the lens has extremely low chromatic aberration and spherical aberration constants.

Abstract: Latch-up propagation is periodically triggered and the intensity of infrared radiation emanating from a CMOS circuit is successively detected at a plurality of measuring points covering the circuit in a grid-like manner at prescribed points in time after the appearance of the trigger signal which triggers latch-up and a measured value representing the intensity of infrared radiation is recorded in a location-dependent manner. The measured values are monitored with a display and the intensity thereof is utilized as the brightness control for the picture elements. Also, the measured values are stored in an image store.

Abstract: Since known methods for investigating latch-up propagation have only a comparatively slight chronological resolution, a method and apparatus are proposed in which latch-up is periodically triggered and the intensity of the infrared radiation emanating from an integrated circuit is sensed at a plurality of measuring points that cover the circuit in a grid-like manner in order to respectively determine, at the measuring points, within what time span the intensity of the infrared radiation reaches a threshold, and to respectively register a measured value representing the time interval in a location-dependent manner.

Abstract: Conventional beam blanking system generate electron pulses having a minimum width of about 100 through 200 ps. Although a reduction of the pulse width to a few tens of picoseconds is fundamentally possible, the reduction of the probe current accompanying this would result to a considerable lengthening of the measuring times. In the invention a photo-cathode (PK) is charged by a pulsed laser beam (LA) which is attached to the column of an electron beam measuring instrument and the photo-electron source is stigmatically imaged onto the beam axis (OA1) using a focusing deflection unit (SFM). A sector field magnet is used as a focusing deflection unit (SFM).

Abstract: For indirect identification of an intensity distribution of particle beam pulses generated in a particle beam measuring instrument by use of a beam blanking system, a signal s(t) known in terms of its time-dependency is periodically fed into a specimen and stroboscopically sampled according to the sampling principle. The desired intensity distribution of the particle beam pulses is subsequently calculated by de-convolution of the measured signal h(t) recorded by the measuring chain.

Abstract: An electrostatic-magnetic lens is provided having either a symmetrical or asymmetrical magnetic lens which is overlaid with an electrostatic immersion lens. One electrode of the immersion lens is formed as a hollow cylinder, which is within an upper pole piece of the magnetic lens concentrically relative to the axis of symmetry thereof and extending into the region of the pole piece gap. The lower pole piece of the magnetic lens is preferably at a ground potential and clad with the beam guiding tube for protection against contamination and forming the lower electrode of the electrostatic immersion lens.

Abstract: A spectrometer-lens for particle beam apparatus is formed by a short focal length magnetic lens having an integrated electrostatic retarding field spectrometer and a single-stage deflection unit arranged within said lens. To avoid deflecting secondary particles that are triggered at a specimen by a primary particle beam, nearly uniform electrical and magnetic deflection fields are generated by the deflection unit oriented relative to one another such that their field vectors reside perpendicular to one another and respectively perpendicular to a velocity vector of the secondary particles attracted from the specimen.

Abstract: A deflection element for an electrostatic opposing field spectrometer includes a grid electrode at a positive potential and a deflection electrode at a negative potential disposed symmetrically thereto, as well as housing portions disposed between the grid electrode and the deflection electrode, so that together they form a generated surface of a hollow cylinder disposed concentric to an optical axis of the spectrometer.

Abstract: The spectrometer objective of the invention is composed of a short focal length objective lens (OL) and a spectrometer-detector arrangement which is completely integrated in the magnetic lens. The working distance (L) has a decisive influence on the chromatic and spherical image defect of the objective lens (OL) which can be reduced with the arrangement of the invention and, thus, the diameter of the electron probe on the specimen (PR) can be substantially demagnified. An angle-independent accumulation of the secondary electrons (SE) are triggered such that the measuring location occurs according to the invention by imaging of the virtual source point (QS) of the secondary electrons (SE) into the center of a spherical opposing field which occurs in the spatial region between two spherical-symmetrical grid electrodes (K1 and K2).

Abstract: A scanning lens system for a particle beam scanning device having deflection elements and optical lenses for corpuscular radiation characterized by the deflecting elements being deflecting dipole elements which are disposed in the particle beam directly preceding at least one imaging lens so that the deflection chromatic aberration for arbitrary deflection angles should disappear and the lens field of a magnetic projection lens should be free of magnetic deflection elements. As a result of the arrangement, the isotropic deflection chromatic aberrations of the dynamically deflecting dipole elements compensates the isotropic off-axis chromatic aberrations of at least one imaging lens and at least one imaging lens forms an image rotation-free system.

Abstract: An apparatus for deflecting and focusing a beam of neutral particles for operating on extremely small workpieces, such as for doping or inscribing micro-electronic components, has a deflection system for generating at least one magnetic field through which the beam of neutral particles is directed for focusing and shaping of the beam on the workpiece. The lens system may include one or more six-pole or eight-pole lenses.

Abstract: An arrangement for particle beam measurement utilizes, an objective for the imaging of primary probe particles on a specimen and a spectrometer for the detection of secondary particles. The arrangement also utilizes the superposition of the electric field of the spectrometer with the electric field of the objective lens to render possible an effective increase of the probe current and/or an improved potential resolution. A portion of the field of the objective is provided for the focusing of the secondary particles onto an electrode for determining energy selection.

Abstract: An apparatus for the potential measuring technique has an objective lens for focusing primary electrons onto an object, and also has a spectrometer for the energy selection of secondary electrons to provide an improvement of the quantitative potential measurement on printed conductors of integrated microelectronic components with improved local resolution, higher probe current, and improved potential resolution. The objective lens is a magnetic lens in which the lens field lies largely outside the lens body, and the spectrometer is an electrostatic retarding field spectrometer arranged in the magnetic field of the lens.

Abstract: An electron-optical system with a variable-shaped beam for generating and measuring microstructures, such as circuits on a semiconductor substrate, generates the variable-shaped electron beam by the use of electron-optical shadow projection imaging and has a remote focus multipole Wehnelt electrode for adjusting, focusing, and controlling the intensity of the electron beam. The system also has a ferrite polecylinder in the beam projections lens with field attenuation or may have a beam projection lens with an external air gap. The length of the electron beam is approximately 60 centimeters.

Abstract: A deflection structure for a corpuscular beam blanking system has two deflection electrodes, a first of which is supplied with a chronologically varying potential, the second of which being connected to a chronologically constant potential for generating standard corpuscular beam pulses. The structure further includes auxiliary electrodes disposed in front of and behind the deflection electrodes in the direction of beam travel for reducing the energy spread of the corpuscular beam, the auxiliary electrodes being supplied with a static voltage.