Abstract: An electron beam evaporation device for vacuum evaporators, comprises, a supporting bar and a retainer for the material to be evaporated, an electron beam source and a deflecting magnet for directing the electron beam onto the material to be evaporated or mounted on said supporting bar. At least two of the elements are mounted on the bar so as to be displaceable thereon. Preferably, the retainer for the material to be evaporated is provided on one end of the bar and the electron beam source and the deflecting magnet are displaceable along the bar.

Abstract: An apparatus for depositing thin coatings by vaporization onto substrates under the simultaneous action of an ionized gas comprises a gas chamber which is subdivided into first and second compartments which are connected to each other through a gas flow restrictor. The first compartment has a gas discharge electrode and has a connection to a supply line for the gas to be ionized. The second compartment contains a counterelectrode, an evaporator and means for holding the objects to be coated and is also connected to a pump to maintain a pressured gradient between the two compartments during vaporization.