Publication number: 20070141363
Abstract: A polymer for imparting repellency and stain resistance to substrates is disclosed of Formula 1: (W)a(R2)b—Si(R1)2—O—[Si(R1)2—O]n—[Si(W)c(R1)d(R2)e—O]m—Si(R1)2—(W)f(R2)g wherein: a, b, c, d, e, f and g are each independently 0 or 1, provided that (a+b) is 1, (f+g) is 1, and (c+d+e) is 2, each R1 is divalently a C1 to C8 alkyl, each R2 is independently H or C1 to C8 alkyl, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof, n=0 to 500, m=1 to 100, each W is independently (Rf—X-A-X)p—Y wherein: Rf is a straight or branched perfluoroalkyl group having from about 2 to about 20 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, each X is independently an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof, A is a 1, 2, 3-triazole, p=0 to 2, and Y is O, OR, N, NR or N(R)2 wherein R is H or C1 to C20 alkyl, optionally containing oxygen,
Type:
Application
Filed:
December 19, 2005
Publication date:
June 21, 2007
Inventors:
Erick Acosta, Axel Herzog, Martial Pabon
Publication number: 20070066762
Abstract: A copolymer for imparting repellency and stain resistance to substrates is disclosed of Formula 1 [Rf—X1-A-X1—Y—C(O)—CZCH2]m—[Wq]p??Formula 1 wherein Rf is a straight or branched perfluoroalkyl group having from about 2 to about 20 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, each X1 is independently an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing a triazole, oxygen, nitrogen, or sulfur, or a combination thereof, A is a 1,2,3-triazole, Y is O or N(R)2 wherein R is H or C1 to C20 alkyl, Z is H, a straight or branched alkyl group having from about 1 to about 4 carbon atoms, or halide, m is a positive integer, q is zero or a positive integer, p is zero or a positive integer, and W is or [R1—X1—Y—C(O)—CH2Z], wherein X1, Y, and Z are as defined above, Rx is C(O)O(R1), C(O)N(R2)2, OC(O)(R1), SO2(R1), C6(R3)5, O(R1), halide, or R1; each R1 is independently H, CnH2n+1, CnH2n—CH(O)CH2, [CH2CH2O]iR4,
Type:
Application
Filed:
September 22, 2005
Publication date:
March 22, 2007
Inventors:
Erick Acosta, Peter Murphy, Andrew McCall, John Sworen