Patents by Inventor Erik Achilles ABEGG

Erik Achilles ABEGG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle
    Patent number: 12298663
    Abstract: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
    Type: Grant
    Filed: October 11, 2016
    Date of Patent: May 13, 2025
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Mária Péter, Erik Achilles Abegg, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Maxim Aleksandrovich Nasalevich, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen
  • Pellicle and pellicle assembly
    Patent number: 12066758
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Grant
    Filed: April 25, 2022
    Date of Patent: August 20, 2024
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
  • MEMBRANE FOR EUV LITHOGRAPHY
    Publication number: 20240004283
    Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
    Type: Application
    Filed: July 28, 2023
    Publication date: January 4, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsbert RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVKOV
  • Membrane for EUV lithography
    Patent number: 11762281
    Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: September 19, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20220252974
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Application
    Filed: April 25, 2022
    Publication date: August 11, 2022
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willlem-Pieter VOORTHUIJZEN, James Norman WILEY
  • Pellicle and pellicle assembly
    Patent number: 11347142
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: May 31, 2022
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20210208500
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Application
    Filed: March 19, 2021
    Publication date: July 8, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
  • Pellicle and pellicle assembly
    Patent number: 10983431
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: April 20, 2021
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
  • MEMBRANE FOR EUV LITHOGRAPHY
    Publication number: 20210109438
    Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
    Type: Application
    Filed: December 22, 2020
    Publication date: April 15, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
  • Membrane for EUV lithography
    Patent number: 10908496
    Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
    Type: Grant
    Filed: April 12, 2017
    Date of Patent: February 2, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20200064731
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Application
    Filed: October 30, 2019
    Publication date: February 27, 2020
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnould Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN-ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
  • Pellicle and pellicle assembly
    Patent number: 10466585
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
    Type: Grant
    Filed: December 2, 2016
    Date of Patent: November 5, 2019
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
  • A MEMBRANE FOR EUV LITHOGRAPHY
    Publication number: 20190129299
    Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
    Type: Application
    Filed: April 12, 2017
    Publication date: May 2, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maxim Aleksandrovich NASALEVICH, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsber RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVICOV
  • METHOD OF MANUFACTURING A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A LITHOGRAPHIC APPARATUS, A DEVICE MANUFACTURING METHOD, AN APPARATUS FOR PROCESSING A PELLICLE, AND A METHOD FOR PROCESSING A PELLICLE
    Publication number: 20190056654
    Abstract: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
    Type: Application
    Filed: October 11, 2016
    Publication date: February 21, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Mária PÉTER, Erik Achilles ABEGG, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Maxim Aleksandrovich NASALEVICH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20180364561
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
    Type: Application
    Filed: December 2, 2016
    Publication date: December 20, 2018
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY