Patents by Inventor Erik Bijlaart

Erik Bijlaart has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070132970
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
    Type: Application
    Filed: June 8, 2006
    Publication date: June 14, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Bijlaart, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Hendricus Meijer, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Roelof Ritsema, Frank Van Schaik, Thimotheus Sengers, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050264778
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: June 1, 2004
    Publication date: December 1, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Meijer, Jeroen Maria Mertens, Johannes Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen