Abstract: A control device for controlling the transmittance of an electrochromic device includes a power source, an electrical load sensing circuit, and a processor electrically coupled to the electrical load sensing circuit and a power source. The processor is configured to receive a measured electrical load value from the electrical load sensing circuit indicating an electrical property of the electrochromic device, further configured to control one or more properties of the electrochromic device by controlling the amount of current or voltage supplied from the power source to the electrochromic device, and yet further configured to vary a property of the electrochromic device while maintaining the electrochromic device at a substantially consistent transmissivity.

Abstract: A control device for controlling the transmittance of an electrochromic device includes a power source, an electrical load sensing circuit, and a processor electrically coupled to the electrical load sensing circuit and a power source. The processor is configured to receive a measured electrical load value from the electrical load sensing circuit indicating an electrical property of the electrochromic device, further configured to control one or more properties of the electrochromic device by controlling the amount of current or voltage supplied from the power source to the electrochromic device, and yet further configured to vary a property of the electrochromic device while maintaining the electrochromic device at a substantially consistent transmissivity.

Abstract: An insulative separation element bridges first and second conductive spacer ends of a spacer frame of an active or insulated glazing unit. The insulative separation element includes first and second outer sections dimensioned for placement into the first and second conductive spacer ends. The insulative separation element includes an intermediate section connecting the first and second outer sections. The intermediate section has opposing first and second faces dimensioned for abutment with and insulative separation of the first and second spacer ends, respectively.

Abstract: A method and apparatus for providing uniform coatings of lithium on a substrate are provided. In one aspect of the present invention is a method of selectively controlling the uniformity and/or rate of deposition of a metal or lithium in a sputter process by introducing a quantity of reactive gas over a specified area in the sputter chamber. This method is applicable to planar and rotating targets.

Abstract: A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12% silicon are especially preferred. Oxygen, nitrogen, compounds of oxygen and compounds of nitrogen are preferred reactive gases. A range of combinations of oxygen and nitrogen are particularly preferred. The method provides durable transparent coatings which may be used as an overcoating for a metal or dielectric coating to provide increased resistance to abrasion and corrosion. In particular, the protected coating may be a metal, dielectric or dielectric-metal-dielectric coating as used in double-glazed window units for buildings or vehicles.

Abstract: Disclosed is an optical data storage device and system, and a method of doing one or more of entering data into, reading data out of, or erasing data from the device. The optical data storage device is characterized by an encapsulated structure including an optically non-transmissive, chalcogenide, phase changeable layer. The phase changeable layer is sufficiently thick such that the impinging vitrifiying energy pulse does not vitrify all the way through the layer.