Patents by Inventor Erik Freer
Erik Freer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11407695Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.Type: GrantFiled: February 17, 2021Date of Patent: August 9, 2022Assignee: Lummus Technology LLCInventors: Joel Cizeron, Guido Radaelli, Satish Lakhapatri, Erik Freer, Jin Ki Hong, Jarod McCormick, David Sheridan, Charles Reid, Roberto Pellizzari, Samuel Weinberger, Justin Dwight Edwards
-
Patent number: 11370724Abstract: Catalytic forms and formulations are provided. The catalytic forms and formulations are useful in a variety of catalytic reactions, for example, the oxidative coupling of methane. Related methods for use and manufacture of the same are also disclosed.Type: GrantFiled: March 27, 2019Date of Patent: June 28, 2022Assignee: Lummus Technology LLCInventors: Joel M. Cizeron, Fabio R. Zurcher, Jarod McCormick, Joel Gamoras, Roger Vogel, Joel David Vincent, Greg Nyce, Wayne P. Schammel, Erik C. Scher, Daniel Rosenberg, Erik-Jan Ras, Erik Freer
-
Publication number: 20210246086Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.Type: ApplicationFiled: February 17, 2021Publication date: August 12, 2021Inventors: Joel CIZERON, Guido RADAELLI, Satish LAKHAPATRI, Erik FREER, Jin Ki HONG, Jarod MCCORMICK, David SHERIDAN, Charles REID, Roberto PELLIZZARI, Samuel WEINBERGER, Justin Dwight EDWARDS
-
Patent number: 10927056Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.Type: GrantFiled: March 1, 2019Date of Patent: February 23, 2021Assignee: Lummus Technology LLCInventors: Joel Cizeron, Guido Radaelli, Satish Lakhapatri, Erik Freer, Jin Ki Hong, Jarod McCormick, David Sheridan, Charles Reid, Roberto Pellizzari, Samuel Weinberger, Justin Dwight Edwards
-
Publication number: 20200031734Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.Type: ApplicationFiled: March 1, 2019Publication date: January 30, 2020Inventors: Joel CIZERON, Guido RADAELLI, Satish LAKHAPATRI, Erik FREER, Jin Ki HONG, Jarod MCCORMICK, David SHERIDAN, Charles REID, Roberto PELLIZZARI, Samuel WEINBERGER, Justin Dwight EDWARDS
-
Publication number: 20200024214Abstract: Catalytic forms and formulations are provided. The catalytic forms and formulations are useful in a variety of catalytic reactions, for example, the oxidative coupling of methane. Related methods for use and manufacture of the same are also disclosed.Type: ApplicationFiled: March 27, 2019Publication date: January 23, 2020Inventors: Joel M. Cizeron, Fabio R. Zurcher, Jarod McCormick, Joel Gamoras, Roger Vogel, Joel David Vincent, Greg Nyce, Wayne P. Schammel, Erik C. Scher, Daniel Rosenberg, Erik-Jan Ras, Erik Freer
-
Patent number: 10301234Abstract: Integrated systems are provided for the production of higher hydrocarbon compositions, for example liquid hydrocarbon compositions, from methane using an oxidative coupling of methane system to convert methane to ethylene, followed by conversion of ethylene to selectable higher hydrocarbon products. Integrated systems and processes are provided that process methane through to these higher hydrocarbon products.Type: GrantFiled: January 7, 2015Date of Patent: May 28, 2019Assignee: SILURIA TECHNOLOGIES, INC.Inventors: Greg Nyce, Richard Black, Peter Czerpak, Carlos Faz, Erik Freer, Hatem Harraz, Ajay Madgavkar, Jarod McCormick, William Michalak, Bipinkumar Patel, Guido Radaelli, Tim A. Rappold, Ron Runnebaum, Erik C. Scher, Aihua Zhang, Hassan Taheri, Humera A. Rafique, Joel Cizeron, Jin Ki Hong, Wayne Schammel
-
Patent number: 10047020Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.Type: GrantFiled: November 25, 2014Date of Patent: August 14, 2018Assignee: SILURIA TECHNOLOGIES, INC.Inventors: Joel Cizeron, Guido Radaelli, Satish Lakhapatri, Erik Freer, Jin Ki Hong, Jarod McCormick, David Sheridan, Charles Reid, Roberto Pellizzari, Samuel Weinberger, Justin Dwight Edwards
-
Publication number: 20160281256Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.Type: ApplicationFiled: June 8, 2016Publication date: September 29, 2016Inventors: Erik FREER, James M. HAMILTON, David P. STUMBO, Kenji KOMIYA, Akihide SHIBATA
-
Patent number: 9390951Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.Type: GrantFiled: July 24, 2014Date of Patent: July 12, 2016Assignee: SHARP KABUSHIKI KAISHAInventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
-
Publication number: 20150232395Abstract: Integrated systems are provided for the production of higher hydrocarbon compositions, for example liquid hydrocarbon compositions, from methane using an oxidative coupling of methane system to convert methane to ethylene, followed by conversion of ethylene to selectable higher hydrocarbon products. Integrated systems and processes are provided that process methane through to these higher hydrocarbon products.Type: ApplicationFiled: January 7, 2015Publication date: August 20, 2015Inventors: Greg Nyce, Richard Black, Peter Czerpak, Carlos Faz, Erik Freer, Hatem Harraz, Ajay Madgavkar, Jarod McCormick, William Michalak, Bipinkumar Patel, Guido Radaelli, Tim A. Rappold, Ron Runnebaum, Erik C. Scher, Aihua Zhang, Hassan Taheri, Humera A. Rafique, Joel Cizeron, Jin Ki Hong, Wayne Schammel
-
Publication number: 20150152025Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.Type: ApplicationFiled: November 25, 2014Publication date: June 4, 2015Inventors: Joel CIZERON, Guido RADAELLI, Satish LAKHAPATRI, Erik FREER, Jin Ki HONG, Jarod MCCORMICK, David SHERIDAN, Charles REID, Roberto PELLIZZARI, Samuel WEINBERGER, Justin Dwight EDWARDS
-
Publication number: 20140331930Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.Type: ApplicationFiled: July 24, 2014Publication date: November 13, 2014Applicants: SHARP KABUSHIKI KAISHA, OneD Material LLCInventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
-
Publication number: 20140121433Abstract: Catalytic forms and formulations are provided. The catalytic forms and formulations are useful in a variety of catalytic reactions, for example, the oxidative coupling of methane. Related methods for use and manufacture of the same are also disclosed.Type: ApplicationFiled: May 23, 2013Publication date: May 1, 2014Inventors: Joel M. Cizeron, Fabio R. Zurcher, Jarod McCormick, Joel Gamoras, Roger Vogel, Joel David Vincent, Greg Nyce, Wayne P. Schammel, Erik C. Scher, Daniel Rosenberg, Erik-Jan Ras, Erik Freer
-
Publication number: 20120135158Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.Type: ApplicationFiled: May 25, 2010Publication date: May 31, 2012Applicants: SHARP KABUSHIKI KAISHA, NANOSYS, INC.Inventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
-
Publication number: 20110165337Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.Type: ApplicationFiled: January 19, 2011Publication date: July 7, 2011Applicant: NANOSYS, INC.Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
-
Patent number: 7892610Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.Type: GrantFiled: May 2, 2008Date of Patent: February 22, 2011Assignee: Nanosys, Inc.Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
-
Publication number: 20080280069Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.Type: ApplicationFiled: May 2, 2008Publication date: November 13, 2008Applicant: Nanosys, Inc.Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
-
Publication number: 20080148595Abstract: A method for processing a substrate using a proximity head is disclosed. The method is initiated by, providing a head with a head surface positioned proximate to a surface of the substrate. The head has a width and a length, and the head has a plurality of ports that are configured in rows along the length of the head. The plurality of rows can extend over a width of the head, and there is a first group of ports configured to dispense a first fluid. The first fluid is dispensed to the surface of the substrate forming a meniscus between the surface of the substrate and the surface of the head. The method also includes delivering gaseous carbon dioxide from a second group of ports of the head to an interface between the meniscus and the substrate. The carbon dioxide assists in promoting a reduced surface tension on the meniscus relative to surface of the substrate.Type: ApplicationFiled: December 20, 2006Publication date: June 26, 2008Applicant: Lam Research CorporationInventors: John M. de Larios, Paul A. Kittle, Michael Ravkin, Mikhail Korolik, Erik Freer, Katrina Mikhaylich, Fritz C. Redeker
-
Publication number: 20070084483Abstract: A method for cleaning a substrate is provided. The method initiates with applying an activation solution to a surface of the substrate. The activation solution and the surface of the substrate are contacted with a surface of a solid cleaning surface. The activation solution is absorbed into a portion of the solid cleaning element and then the substrate or the solid cleaning surface is moved relative to each other to clean the surface of the substrate. A method for cleaning the surface of the substrate with a solid cleaning element that experiences plastic deformation is also provided. Corresponding cleaning apparatuses are also provided.Type: ApplicationFiled: December 18, 2006Publication date: April 19, 2007Inventors: Erik Freer, John deLarios, Katrina Mikhaylichenko, Michael Ravkin, Mikhail Korolik, Fred Redeker