Patents by Inventor Erik Freer

Erik Freer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11407695
    Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.
    Type: Grant
    Filed: February 17, 2021
    Date of Patent: August 9, 2022
    Assignee: Lummus Technology LLC
    Inventors: Joel Cizeron, Guido Radaelli, Satish Lakhapatri, Erik Freer, Jin Ki Hong, Jarod McCormick, David Sheridan, Charles Reid, Roberto Pellizzari, Samuel Weinberger, Justin Dwight Edwards
  • Patent number: 11370724
    Abstract: Catalytic forms and formulations are provided. The catalytic forms and formulations are useful in a variety of catalytic reactions, for example, the oxidative coupling of methane. Related methods for use and manufacture of the same are also disclosed.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: June 28, 2022
    Assignee: Lummus Technology LLC
    Inventors: Joel M. Cizeron, Fabio R. Zurcher, Jarod McCormick, Joel Gamoras, Roger Vogel, Joel David Vincent, Greg Nyce, Wayne P. Schammel, Erik C. Scher, Daniel Rosenberg, Erik-Jan Ras, Erik Freer
  • Publication number: 20210246086
    Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.
    Type: Application
    Filed: February 17, 2021
    Publication date: August 12, 2021
    Inventors: Joel CIZERON, Guido RADAELLI, Satish LAKHAPATRI, Erik FREER, Jin Ki HONG, Jarod MCCORMICK, David SHERIDAN, Charles REID, Roberto PELLIZZARI, Samuel WEINBERGER, Justin Dwight EDWARDS
  • Patent number: 10927056
    Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: February 23, 2021
    Assignee: Lummus Technology LLC
    Inventors: Joel Cizeron, Guido Radaelli, Satish Lakhapatri, Erik Freer, Jin Ki Hong, Jarod McCormick, David Sheridan, Charles Reid, Roberto Pellizzari, Samuel Weinberger, Justin Dwight Edwards
  • Publication number: 20200031734
    Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.
    Type: Application
    Filed: March 1, 2019
    Publication date: January 30, 2020
    Inventors: Joel CIZERON, Guido RADAELLI, Satish LAKHAPATRI, Erik FREER, Jin Ki HONG, Jarod MCCORMICK, David SHERIDAN, Charles REID, Roberto PELLIZZARI, Samuel WEINBERGER, Justin Dwight EDWARDS
  • Publication number: 20200024214
    Abstract: Catalytic forms and formulations are provided. The catalytic forms and formulations are useful in a variety of catalytic reactions, for example, the oxidative coupling of methane. Related methods for use and manufacture of the same are also disclosed.
    Type: Application
    Filed: March 27, 2019
    Publication date: January 23, 2020
    Inventors: Joel M. Cizeron, Fabio R. Zurcher, Jarod McCormick, Joel Gamoras, Roger Vogel, Joel David Vincent, Greg Nyce, Wayne P. Schammel, Erik C. Scher, Daniel Rosenberg, Erik-Jan Ras, Erik Freer
  • Patent number: 10301234
    Abstract: Integrated systems are provided for the production of higher hydrocarbon compositions, for example liquid hydrocarbon compositions, from methane using an oxidative coupling of methane system to convert methane to ethylene, followed by conversion of ethylene to selectable higher hydrocarbon products. Integrated systems and processes are provided that process methane through to these higher hydrocarbon products.
    Type: Grant
    Filed: January 7, 2015
    Date of Patent: May 28, 2019
    Assignee: SILURIA TECHNOLOGIES, INC.
    Inventors: Greg Nyce, Richard Black, Peter Czerpak, Carlos Faz, Erik Freer, Hatem Harraz, Ajay Madgavkar, Jarod McCormick, William Michalak, Bipinkumar Patel, Guido Radaelli, Tim A. Rappold, Ron Runnebaum, Erik C. Scher, Aihua Zhang, Hassan Taheri, Humera A. Rafique, Joel Cizeron, Jin Ki Hong, Wayne Schammel
  • Patent number: 10047020
    Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.
    Type: Grant
    Filed: November 25, 2014
    Date of Patent: August 14, 2018
    Assignee: SILURIA TECHNOLOGIES, INC.
    Inventors: Joel Cizeron, Guido Radaelli, Satish Lakhapatri, Erik Freer, Jin Ki Hong, Jarod McCormick, David Sheridan, Charles Reid, Roberto Pellizzari, Samuel Weinberger, Justin Dwight Edwards
  • Publication number: 20160281256
    Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
    Type: Application
    Filed: June 8, 2016
    Publication date: September 29, 2016
    Inventors: Erik FREER, James M. HAMILTON, David P. STUMBO, Kenji KOMIYA, Akihide SHIBATA
  • Patent number: 9390951
    Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: July 12, 2016
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
  • Publication number: 20150232395
    Abstract: Integrated systems are provided for the production of higher hydrocarbon compositions, for example liquid hydrocarbon compositions, from methane using an oxidative coupling of methane system to convert methane to ethylene, followed by conversion of ethylene to selectable higher hydrocarbon products. Integrated systems and processes are provided that process methane through to these higher hydrocarbon products.
    Type: Application
    Filed: January 7, 2015
    Publication date: August 20, 2015
    Inventors: Greg Nyce, Richard Black, Peter Czerpak, Carlos Faz, Erik Freer, Hatem Harraz, Ajay Madgavkar, Jarod McCormick, William Michalak, Bipinkumar Patel, Guido Radaelli, Tim A. Rappold, Ron Runnebaum, Erik C. Scher, Aihua Zhang, Hassan Taheri, Humera A. Rafique, Joel Cizeron, Jin Ki Hong, Wayne Schammel
  • Publication number: 20150152025
    Abstract: In an aspect, the present disclosure provides a method for the oxidative coupling of methane to generate hydrocarbon compounds containing at least two carbon atoms (C2+ compounds). The method can include mixing a first gas stream comprising methane with a second gas stream comprising oxygen to form a third gas stream comprising methane and oxygen and performing an oxidative coupling of methane (OCM) reaction using the third gas stream to produce a product stream comprising one or more C2+ compounds.
    Type: Application
    Filed: November 25, 2014
    Publication date: June 4, 2015
    Inventors: Joel CIZERON, Guido RADAELLI, Satish LAKHAPATRI, Erik FREER, Jin Ki HONG, Jarod MCCORMICK, David SHERIDAN, Charles REID, Roberto PELLIZZARI, Samuel WEINBERGER, Justin Dwight EDWARDS
  • Publication number: 20140331930
    Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
    Type: Application
    Filed: July 24, 2014
    Publication date: November 13, 2014
    Applicants: SHARP KABUSHIKI KAISHA, OneD Material LLC
    Inventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
  • Publication number: 20140121433
    Abstract: Catalytic forms and formulations are provided. The catalytic forms and formulations are useful in a variety of catalytic reactions, for example, the oxidative coupling of methane. Related methods for use and manufacture of the same are also disclosed.
    Type: Application
    Filed: May 23, 2013
    Publication date: May 1, 2014
    Inventors: Joel M. Cizeron, Fabio R. Zurcher, Jarod McCormick, Joel Gamoras, Roger Vogel, Joel David Vincent, Greg Nyce, Wayne P. Schammel, Erik C. Scher, Daniel Rosenberg, Erik-Jan Ras, Erik Freer
  • Publication number: 20120135158
    Abstract: Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
    Type: Application
    Filed: May 25, 2010
    Publication date: May 31, 2012
    Applicants: SHARP KABUSHIKI KAISHA, NANOSYS, INC.
    Inventors: Erik Freer, James M. Hamilton, David P. Stumbo, Kenji Komiya, Akihide Shibata
  • Publication number: 20110165337
    Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.
    Type: Application
    Filed: January 19, 2011
    Publication date: July 7, 2011
    Applicant: NANOSYS, INC.
    Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
  • Patent number: 7892610
    Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: February 22, 2011
    Assignee: Nanosys, Inc.
    Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
  • Publication number: 20080280069
    Abstract: Methods and systems for applying nanowires and electrical devices to surfaces are described. In a first aspect, at least one nanowire is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate the at least one nanowire with the electrodes. The electrode pair is aligned with a region of the destination surface. The at least one nanowire is deposited from the electrode pair to the region. In another aspect, a plurality of electrical devices is provided proximate to an electrode pair. An electric field is generated by electrodes of the electrode pair to associate an electrical device of the plurality of electrical devices with the electrodes. The electrode pair is aligned with a region of the destination surface. The electrical device is deposited from the electrode pair to the region.
    Type: Application
    Filed: May 2, 2008
    Publication date: November 13, 2008
    Applicant: Nanosys, Inc.
    Inventors: J. Wallace Parce, James M. Hamilton, Samuel Martin, Erik Freer
  • Publication number: 20080148595
    Abstract: A method for processing a substrate using a proximity head is disclosed. The method is initiated by, providing a head with a head surface positioned proximate to a surface of the substrate. The head has a width and a length, and the head has a plurality of ports that are configured in rows along the length of the head. The plurality of rows can extend over a width of the head, and there is a first group of ports configured to dispense a first fluid. The first fluid is dispensed to the surface of the substrate forming a meniscus between the surface of the substrate and the surface of the head. The method also includes delivering gaseous carbon dioxide from a second group of ports of the head to an interface between the meniscus and the substrate. The carbon dioxide assists in promoting a reduced surface tension on the meniscus relative to surface of the substrate.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Applicant: Lam Research Corporation
    Inventors: John M. de Larios, Paul A. Kittle, Michael Ravkin, Mikhail Korolik, Erik Freer, Katrina Mikhaylich, Fritz C. Redeker
  • Publication number: 20070084483
    Abstract: A method for cleaning a substrate is provided. The method initiates with applying an activation solution to a surface of the substrate. The activation solution and the surface of the substrate are contacted with a surface of a solid cleaning surface. The activation solution is absorbed into a portion of the solid cleaning element and then the substrate or the solid cleaning surface is moved relative to each other to clean the surface of the substrate. A method for cleaning the surface of the substrate with a solid cleaning element that experiences plastic deformation is also provided. Corresponding cleaning apparatuses are also provided.
    Type: Application
    Filed: December 18, 2006
    Publication date: April 19, 2007
    Inventors: Erik Freer, John deLarios, Katrina Mikhaylichenko, Michael Ravkin, Mikhail Korolik, Fred Redeker