Abstract: An imaging system for a portable electronic device includes a variable aperture between a lens group and an image sensor. The variable aperture is defined by an electrochromic stack that defines a switching region and a central non-switching region. The non-switching region can be etched through the same material or set of materials defining the switching region and is backfilled with a dielectric transparent material having an index of refraction substantially equal to an average index of refraction of the layer(s) of the switching region of the electrochromic stack. This construction substantially reduces visible light absorption of the variable aperture.

Abstract: An imaging system for a portable electronic device includes a variable aperture between a lens group and an image sensor. The variable aperture is defined by an electrochromic stack that defines at least two switching regions and a central non-switching region. The switching regions can be defined by concentric ring electrodes disposed below an electrochromic stack including a counter electrode, an ion conductor layer, and an electrochromic material. Above the electrochromic stack is disposed a shared electrode. The shared electrode and the concentric ring electrodes can be formed from indium tin oxide. By applying at least a threshold voltage to one or more of the concentric ring electrodes, an electric field can be generated by each driven electrode and a respective portion of the shared electrode, inducing a transition from a bleached state to a colored state in a respective portion of the electrochromic stack.

Abstract: An imaging system for a portable electronic device includes a variable aperture between a lens group and an image sensor. The variable aperture is defined by an electrochromic stack that defines a switching region and a central non-switching region. The electrochromic stack is defined by a layer of electrochromic material in which an electrochromic crystallite dispersion (e.g., nickel oxide) is suspended in a field of a lithiated ion conductor layer (e.g., lithiated tungsten nickel oxide).

Abstract: A control device for controlling the transmittance of an electrochromic device includes a power source, an electrical load sensing circuit, and a processor electrically coupled to the electrical load sensing circuit and a power source. The processor is configured to receive a measured electrical load value from the electrical load sensing circuit indicating an electrical property of the electrochromic device, further configured to control one or more properties of the electrochromic device by controlling the amount of current or voltage supplied from the power source to the electrochromic device, and yet further configured to vary a property of the electrochromic device while maintaining the electrochromic device at a substantially consistent transmissivity.

Abstract: A control device for controlling the transmittance of an electrochromic device includes a power source, an electrical load sensing circuit, and a processor electrically coupled to the electrical load sensing circuit and a power source. The processor is configured to receive a measured electrical load value from the electrical load sensing circuit indicating an electrical property of the electrochromic device, further configured to control one or more properties of the electrochromic device by controlling the amount of current or voltage supplied from the power source to the electrochromic device, and yet further configured to vary a property of the electrochromic device while maintaining the electrochromic device at a substantially consistent transmissivity.

Abstract: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings.

Abstract: A method, apparatus and carrier for coating a CRT screen after assembly. The method and apparatus includes isolating a surface portion of the CRT to be coated from the remaining surface to prevent or minimize coating problems resulting from outgassing or difficulty in controlling coating process parameters and to isolate noncompatible components from the deposition environment.

Abstract: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings for later objects passing through the system.

Abstract: A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.

Abstract: A method, apparatus and carrier for coating a CRT screen after assembly. The method and apparatus includes isolating a surface portion of the CRT to be coated from the remaining surface to prevent or minimize coating problems resulting from outgassing or difficulty in controlling coating process parameters and to isolate noncompatible components from the deposition environment.

Abstract: A method and apparatus for cleaning a substrate in preparation for thin film coating. The invention involves cleaning the substrate in a cleaning chamber under controlled conditions by a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium.

Abstract: A method and apparatus for coating a CRT screen after assembly. The method and apparatus includes isolating a surface portion of the CRT to be coated from the remaining surface to prevent or minimize coating problems resulting from outgassing and to isolate noncompatible components from the deposition environment.

Abstract: A multilayer antireflection coating for a temperature sensitive substrate such as plastic. One layer is a DC reactively sputtered metal oxide which may be deposited quickly and without imparting a large amount of heat to the substrate. Another layer has a refractive index lower than the substrate.

Abstract: A method and apparatus for coating a CRT screen after assembly. The method and apparatus includes isolating a surface portion of the CRT to be coated from the remaining surface to prevent or minimize coating problems resulting from outgassing and to isolate noncompatible components from the deposition environment.

Abstract: A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.

Abstract: An antireflection coating for a substrate including four layers and having optimized photopic reflectance and optimized for deposition by sputtering. The first layer (the layer farthest from the substrate) has a refractive index less than the refractive index of the substrate and a thickness of about one-quarter wavelength. The second layer (the layer adjacent the first layer) has an refractive index greater than about 2.2 and a thickness of about a half wavelength. The third layer has refractive index less than that of the second layer. The fourth layer (the layer adjacent the substrate) has a refractive index less than about 2.0 and greater than that of the third layer. The combined thickness of the third and fourth layers is less than about a quarter wavelength. The first and third layers may include silicon dioxide. The second layer may include titanium dioxide or niobium oxide. The fourth layer may include indium oxide, tin oxide, indium tin oxide, or zinc oxide.

Abstract: A coating for an article comprising layers of nitrides of certain transition metals to provide an electrically-conductive, light-attenuating, antireflection surface.

Abstract: An apparatus for rotatably mounting a cylindrical magnetron in a vacuum chamber. The apparatus includes a bearing housing having one end extending into the vacuum chamber with the other end located outside the chamber. A drive shaft is rotatably mounted in the bearing housing. Each end of the drive shaft extends beyond the housing. The cylindrical magnetron is attached to the end of the drive shaft inside the chamber. A vacuum seal is located in the bearing housing for sealing the drive shaft to the housing. The drive shaft is mounted in the housing such that the load of the magnetron is not transferred to the vacuum seal.

Abstract: A mask arrangement is located between the cathode and substrate in an in-line sputtering system. The relative shape of the mask may be changed from outside the system. Thus, film thickness uniformity can be modified and controlled without interrupting the sputtering process.

Abstract: A multilayer antireflection coating for a temperature sensitive substrate such as plastic. One layer is a DC reactively sputtered metal oxide which may be deposited quickly and without imparting a large amount of heat to the substrate. Another layer has a refractive index lower than the substrate.