Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Abstract: An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Abstract: An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.

Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450?) disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.