Abstract: An internal loop reactor comprises: a vertically disposed cylindrical vessel comprising a sidewall and reactor fluid outlet means; and at least one draft tube arranged vertically within the vessel. The draft tube(s) have/s an inner surface and an outer surface, wherein the draft tube(s) provide(s) (a) first conduit(s) within the draft tube(s) having a tube inlet end and a tube outlet end, and a second conduit outside of the draft tube(s) and within the sidewall, the first conduit(s) being in fluid communication with the second conduit. The reactor comprises at least one nozzle arranged concentrically to the draft tube(s) for injecting a fluid into the first conduit(s) from the tube inlet end. The inner surface of the draft tube(s) convexly curves so that the first conduit(s) exhibit(s) an annular constriction of the cross-section between the tube inlet end and the tube outlet end; wherein the constriction is located closer to the tube inlet end.

Abstract: An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.

Abstract: Disclosed is a method of assessing a degree of saturation of an absorbent hygiene article that includes at least a first and second sensing elements the method including detecting a first value from the first sensing element; and detecting a second value from the second sensing element, at least one of assessing that a degree of saturation of the absorbent hygiene article is substantially zero if the first value does not pass a first threshold and the second value does not pass a second threshold; assessing that a first degree of saturation is present in the absorbent hygiene article if the first value passes the first threshold and the second value does not pass the second threshold; and assessing that a second degree of saturation is present in the absorbent hygiene article if the first value passes the first threshold and the second value passes the second threshold.

Abstract: A removal device for removing gas bubbles and/or dirt particles from a liquid in a liquid conduit system includes a main channel for a main flow, the main channel having an entry and an exit which are configured to be connected to the conduit system; a housing which defines an inner space; at least one supply channel extending from the main channel to the inner space; at least one return channel extending from the inner space back to the main channel; and a branch flow control member positioned in the main channel. The branch flow control member being movable between a first position to branch off at least a part of the incoming main flow into the inner space via the supply channel and a second position to branch off at least a part of the incoming main flow into the inner space via the supply channel.

Abstract: The present disclosure relates to a strip element configured to be internally or externally, fixedly or removably provided to an absorbent hygiene article, such as a diaper. The strip element comprises at least one sensing element for obtaining excretion-related information in a hygiene article such as a diaper, the sensing element having a capacitor electrode, a signal line, and a ground element such as a ground electrode and/or ground line. The capacitor electrode and the ground element are for measuring an impedance. The capacitor electrode is electrically connected to the signal line. The sensing element further comprises a shielding component provided between the signal line and the ground element. The strip element is configured such that an electric potential of the shielding component synchronously oscillates with an electric potential of the signal line.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: Disclosed is a method of distinguishing between types of excretion in an absorbent hygiene article provided with a strip element including a first temperature sensing element, and a first impedance sensing element, the method including detecting a first temperature value, and detecting a first impedance value the method further including at least one determining that no excretion is present if the first temperature value does not pass a first temperature threshold and the first impedance value does not pass a first impedance threshold, determining that a first type of excretion is present if the first temperature value passes the first temperature threshold and the first impedance value passes the first impedance threshold; and determining that a second type of excretion is present if the first temperature value passes the first temperature threshold and the first impedance value does not pass the first impedance threshold.

Abstract: Disclosed is a strip element configured to be externally and removably provided to an absorbent hygiene article, the strip element comprising at least two sensing elements for obtaining excretion-related information in the absorbent hygiene article, at least two close contact sensing zones for being removably attached to a garment facing surface of the absorbent hygiene article, respectively, and each comprising one of the at least two sensing elements, wherein, each close contact sensing zone includes first attachment means for keeping the close contact sensing zone in contact with the absorbent hygiene article by a first attachment force, the two close contact sensing zones being separated by a flex zone which is either free of any attachment means or includes second attachment means for establishing a second attachment force between the flex zone and the absorbent hygiene article, the second attachment force being a smaller force than the first contact force.

Abstract: An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: A rotor blade airfoil of a turbomachine, which rotor blade airfoil has: a leading edge, a trailing edge, and a profile chord length which is dependent on the height of the blade airfoil. In a side view of the blade airfoil, a maximum projected chord length his defined as the axial spacing between the axially foremost point of the leading edge and the axially rearmost point of the trailing edge of the blade airfoil in the side view under consideration. Here, the axial position of the leading edge varies in a manner dependent on the height of the blade airfoil above a front axial region.

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

Abstract: A method for improving the yield of a lithographic process, the method including: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.

Abstract: A method for optimizing a sequence of processes for manufacturing of product units, includes: associating measurement results of performance parameters (e.g., fingerprints) with the recorded process characteristics (e.g., context); obtaining a characteristic (e.g., context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining a characteristic (e.g., context) of a subsequent process (e.g., exposure) in the sequence to be performed on the product unit; determining a predicted performance parameter (e.g., fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (e.g., fingerprints) corresponding to the recorded characteristics; and determining corrections to be applied to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold.

Abstract: A method for optimizing a sequence of processes for manufacturing of product units, includes: associating measurement results of performance parameters (e.g., fingerprints) with the recorded process characteristics (e.g., context); obtaining a characteristic (e.g., context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining a characteristic (e.g., context) of a subsequent process (e.g., exposure) in the sequence to be performed on the product unit; determining a predicted performance parameter (e.g., fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (e.g., fingerprints) corresponding to the recorded characteristics; and determining corrections to be applied to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.

Abstract: A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold.