Patents by Inventor Erik Jose Smeets

Erik Jose Smeets has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070258076
    Abstract: A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.
    Type: Application
    Filed: May 8, 2006
    Publication date: November 8, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Antonius Maria Derksen, Erik Jose Smeets, David Ockwell, Henricus Jozef Lenders
  • Substrate distortion measurement
    Publication number: 20070026325
    Abstract: A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the substrate and to transform the distortion data into a frequency domain representation. The distortion data may alternatively be transformed into an orthogonal polynomial or an orthonormal polynomial representation.
    Type: Application
    Filed: July 29, 2005
    Publication date: February 1, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Theodorus Maria Derksen, Pieter Willem De Jager, Erik Jose Smeets