Patents by Inventor Erik Matthias Sohmen

Erik Matthias Sohmen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system and projection objective of a mask inspection apparatus
    Patent number: 10114293
    Abstract: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.
    Type: Grant
    Filed: August 16, 2012
    Date of Patent: October 30, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Heiko Feldmann, Erik Matthias Sohmen, Joachim Stuehler, Oswald Gromer, Ulrich Mueller, Michael Layh, Markus Schwab
  • ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION APPARATUS
    Publication number: 20130038850
    Abstract: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.
    Type: Application
    Filed: August 16, 2012
    Publication date: February 14, 2013
    Inventors: Heiko Feldmann, Erik Matthias Sohmen, Joachim Stuehler, Oswald Gromer, Ulrich Mueller, Michael Layh, Markus Schwab
  • Lithographic apparatus and method
    Publication number: 20080073596
    Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, and a projection system configured to project the beam of radiation. The lithographic apparatus also includes a cooling system that is arranged to pass gas through the interior of the projection system such that the throughput of gas through the interior of the projection system is greater than 100 liters of gas per hour.
    Type: Application
    Filed: August 24, 2006
    Publication date: March 27, 2008
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Antonius Theodorus Anna Maria Derksen, Johannes Wangler, David Christopher Ockwell, Peter Deufel, Erik Matthias Sohmen, Wilhelm Ulrich, Johannes Zellner