Patents by Inventor Erik Roeloff Loopstra

Erik Roeloff Loopstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus device manufacturing method and device manufactured thereby
    Publication number: 20040202898
    Abstract: A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
    Type: Application
    Filed: April 30, 2004
    Publication date: October 14, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Erik Roeloff Loopstra, Dominicus Jacobus Petrus Adrianus Franken
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6765712
    Abstract: A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: July 20, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Erik Roeloff Loopstra, Dominicus Jacobus Petrus Adrianus Franken
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20020011573
    Abstract: A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
    Type: Application
    Filed: July 11, 2001
    Publication date: January 31, 2002
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Erik Roeloff Loopstra, Dominicus Jacobus Petrus Adrianus Franken