Patents by Inventor Erik Ruinemans

Erik Ruinemans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical imaging arrangement with multiple metrology support units
    Patent number: 9976931
    Abstract: An optical imaging arrangement includes an optical projection system and a support structure system. The optical projection system includes a group of optical elements configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask onto a substrate. The support structure system includes an optical element support structure and a metrology support structure. The optical element support structure supports the group of optical elements, while the metrology support structure supports a group of metrology devices associated with the group of optical elements and configured to capture status information representative of at least one of a position and an orientation of each of the optical elements in at least one degree of freedom up to all six degrees of freedom.
    Type: Grant
    Filed: November 10, 2014
    Date of Patent: May 22, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Yim-Bun Patrick Kwan, Erik Ruinemans
  • OPTICAL IMAGING ARRANGEMENT WITH MULTIPLE METROLOGY SUPPORT UNITS
    Publication number: 20150062596
    Abstract: An optical imaging arrangement includes an optical projection system and a support structure system. The optical projection system includes a group of optical elements configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask onto a substrate. The support structure system includes an optical element support structure and a metrology support structure. The optical element support structure supports the group of optical elements, while the metrology support structure supports a group of metrology devices associated with the group of optical elements and configured to capture status information representative of at least one of a position and an orientation of each of the optical elements in at least one degree of freedom up to all six degrees of freedom.
    Type: Application
    Filed: November 10, 2014
    Publication date: March 5, 2015
    Inventors: Yim-Bun Patrick Kwan, Erik Ruinemans