Patents by Inventor Erik S. Rondum

Erik S. Rondum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Materials for chemical mechanical polishing
    Patent number: 7429210
    Abstract: A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively bound to a base film. The polishing article may include various polygonal tiles and oval shapes formed in the polishing material which allow enhanced slurry retention and ease in rolling from a polishing material supply roll and onto a take-up roll in a web type platen assembly. The polishing article may also include an upper carrier film adapted to minimize delaminating stress placed in an area of the polishing article that is not adapted for polishing. A method and apparatus for manufacturing the various embodiments of the polishing article and a replacement supply roll are also disclosed.
    Type: Grant
    Filed: January 23, 2007
    Date of Patent: September 30, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Benjamin A. Bonner, Peter McReynolds, Gregory E. Menk, Anand N. Iyer, Gopalakrishna B. Prabhu, Erik S. Rondum, Robert L. Jackson, Garlen Leung
  • Materials for chemical mechanical polishing
    Patent number: 7179159
    Abstract: A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively bound to a base film. The polishing article may include various polygonal tiles and oval shapes formed in the polishing material which allow enhanced slurry retention and ease in rolling from a polishing material supply roll and onto a take-up roll in a web type platen assembly. The polishing article may also include an upper carrier film adapted to minimize delaminating stress placed in an area of the polishing article that is not adapted for polishing. A method and apparatus for manufacturing the various embodiments of the polishing article and a replacement supply roll are also disclosed.
    Type: Grant
    Filed: May 2, 2005
    Date of Patent: February 20, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Benjamin A. Bonner, Peter McReynolds, Gregory E. Menk, Anand N. Iyer, Gopalakrishna B. Prabhu, Erik S. Rondum, Robert L. Jackson, Garlen Leung
  • Platen with patterned surface for chemical mechanical polishing
    Publication number: 20040072518
    Abstract: A platen having a patterned upper surface for supporting a polishing material in a chemical mechanical polishing system is provided. In one embodiment, a platen for supporting a polishing material in a chemical mechanical polishing system includes a body adapted to support a polishing material during processing and having a substantially rigid non-planar upper support surface for supporting the polishing material during polishing.
    Type: Application
    Filed: October 7, 2003
    Publication date: April 15, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Gopalakrishna B. Prabhu, Erik S. Rondum, Peter McReynolds, Thomas H. Osterheld, Garlen C. Leung, Jack Arluck, Adam H. Zhong, Gregory E. Menk