Patents by Inventor Erik Theodorus Bijlaart

Erik Theodorus Bijlaart has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus
    Publication number: 20050263068
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: October 18, 2004
    Publication date: December 1, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Hoogendam, Bob Streefkerk, Johannes Catharinus Mulkens, Erik Theodorus Bijlaart, Aleksey Kolesnychenko, Erik Loopstra, Jeroen Johannes Sophia Mertens, Bernardus Slaghekke, Patricius Aloysius Tinnemans, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050088635
    Abstract: A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper.
    Type: Application
    Filed: September 22, 2004
    Publication date: April 28, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Hoogendam, Erik Theodorus Bijlaart, Erik Loopstra, Johannes Hubertus Mulkens, Bob Streefkerk