Patents by Inventor Erik Wilson
Erik Wilson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12214912Abstract: A coupling system and a method of coupling two objects. The coupling system including a passive unit having a first side and an opposing second side, the first side having a recess with a lip. The coupling system further having an active unit that includes an actuator, a cam mechanism and a plurality of capture rollers. The cam mechanism is operably coupled to the actuator, the cam mechanism being movable from a stowed position to a deployed position. The plurality of capture rollers is operably coupled to the cam mechanism to move from a first position to a second position in response to the cam mechanism moving from the stowed position to the deployed position, the plurality of capture rollers engaging the lip in the second position when the passive unit is in contact with the active unit.Type: GrantFiled: May 18, 2021Date of Patent: February 4, 2025Assignee: Honeybee Robotics, LLCInventors: Lee Carlson, Shazad Sadick, Jeffrey I. Shasho, John Wilson, Jonah E. Saltzman, Erik Mumm, Jason Herman
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Publication number: 20250033805Abstract: A coupling system and a method of coupling two objects. The coupling system including a passive unit having a first side and an opposing second side, the first side having a recess with a lip. The coupling system further having an active unit that includes an actuator, a cam mechanism and a plurality of capture rollers. The cam mechanism is operably coupled to the actuator, the cam mechanism being movable from a stowed position to a deployed position. The plurality of capture rollers is operably coupled to the cam mechanism to move from a first position to a second position in response to the cam mechanism moving from the stowed position to the deployed position, the plurality of capture rollers engaging the lip in the second position when the passive unit is in contact with the active unit.Type: ApplicationFiled: October 15, 2024Publication date: January 30, 2025Inventors: Lee Carlson, Shazad Sadick, Jeffrey I. Shasho, John Wilson, Jonah E. Saltzman, Erik Mumm, Jason Herman
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Publication number: 20240057994Abstract: An incisionless fully endoscopic method of reducing the capacity of the stomach is provided to surgically treat obesity. The method is directed to endoluminal tissue approximation of a portion of the stomach, including at least a portion of the greater curvature thereof. The method includes a pattern of stitching in which a portion of the stomach is closed off. One stitching pattern causes the lateral portion of the stomach to be drawn to reduce the usable volume of the stomach while maintaining a pathway from the esophagus to the pylorus. As the stitching pattern advances, the fundus is automatically drawn downward so that it may be endoscopically approached for stitching in a facilitated manner According to another aspect of the invention, another stitching pattern extends from the antrum to the fundus between the anterior and posterior portions of the stomach.Type: ApplicationFiled: October 27, 2023Publication date: February 22, 2024Applicant: BOSTON SCIENTIFIC SCIMED, INC.Inventors: Alonso Alvarado, Manoel Galvao, Eddie Gomez, Nicole Pena, Sohail Shaikh, Chris Thompson, Erik Wilson, Natan Zundel, Robert Lulo, Ted Stephens
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Patent number: 11832808Abstract: An incisionless fully endoscopic method of reducing the capacity of the stomach is provided to surgically treat obesity. The method is directed to endoluminal tissue approximation of a portion of the stomach, including at least a portion of the greater curvature thereof. The method includes a pattern of stitching in which a portion of the stomach is closed off. One stitching pattern causes the lateral portion of the stomach to be drawn to reduce the usable volume of the stomach while maintaining a pathway from the esophagus to the pylorus. As the stitching pattern advances, the fundus is automatically drawn downward so that it may be endoscopically approached for stitching in a facilitated manner. According to another aspect of the invention, another stitching pattern extends from the antrum to the fundus between the anterior and posterior portions of the stomach.Type: GrantFiled: April 29, 2019Date of Patent: December 5, 2023Assignee: Apollo Endosurgery US, Inc.Inventors: Alonso Alvarado, Manoel Galvao, Eddie Gomez, Nicole Pena, Sohail Shaikh, Chris Thompson, Erik Wilson, Natan Zundel, Robert Lulo, Ted Stephens
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Publication number: 20210367434Abstract: A method is provided comprising: detecting a connection between an electronic device and a battery charger; transmitting to the battery charger a first request for at least one of a first voltage level and a first current level; receiving from the battery charger a signal; and charging a battery of the electronic device with the signal.Type: ApplicationFiled: August 9, 2021Publication date: November 25, 2021Inventors: Ku-Chul JUNG, Erik Wilson MAIER, Oscar FREITAS, Kisun LEE, Chul-Eun YUN, Kwang-Sub LEE
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Patent number: 11121559Abstract: A method is provided comprising: detecting a connection between an electronic device and a battery charger; transmitting to the battery charger a first request for at least one of a first voltage level and a first current level; receiving from the battery charger a signal; and charging a battery of the electronic device with the signal.Type: GrantFiled: November 19, 2018Date of Patent: September 14, 2021Assignees: Samsung Electronics Co., Ltd., Fairchild Korea Semiconductor Ltd.Inventors: Ku-Chul Jung, Erik Wilson Maier, Oscar Freitas, Kisun Lee, Chul-Eun Yun, Kwang-Sub Lee
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Publication number: 20190247041Abstract: An incisionless fully endoscopic method of reducing the capacity of the stomach is provided to surgically treat obesity. The method is directed to endoluminal tissue approximation of a portion of the stomach, including at least a portion of the greater curvature thereof. The method includes a pattern of stitching in which a portion of the stomach is closed off. One stitching pattern causes the lateral portion of the stomach to be drawn to reduce the usable volume of the stomach while maintaining a pathway from the esophagus to the pylorus. As the stitching pattern advances, the fundus is automatically drawn downward so that it may be endoscopically approached for stitching in a facilitated manner. According to another aspect of the invention, another stitching pattern extends from the antrum to the fundus between the anterior and posterior portions of the stomach.Type: ApplicationFiled: April 29, 2019Publication date: August 15, 2019Applicant: Apollo Endosurgery US, Inc.Inventors: Alonso Alvarado, Manoel Galvao, Eddie Gomez, Nicole Pena, Sohail Shaikh, Chris Thompson, Erik Wilson, Natan Zundel, Robert Lulo, Ted Stephens
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Publication number: 20190097431Abstract: A method is provided comprising: detecting a connection between an electronic device and a battery charger; transmitting to the battery charger a first request for at least one of a first voltage level and a first current level; receiving from the battery charger a signal; and charging a battery of the electronic device with the signal.Type: ApplicationFiled: November 19, 2018Publication date: March 28, 2019Inventors: Ku-Chul JUNG, Erik Wilson MAIER, Oscar FREITAS, Kisun LEE, Chul-Eun YUN, Kwang-Sub LEE
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Patent number: 10135263Abstract: A method is provided comprising: detecting a connection between an electronic device and a battery charger; transmitting to the battery charger a first request for at least one of a first voltage level and a first current level; receiving from the battery charger a signal; and charging a battery of the electronic device with the signal.Type: GrantFiled: December 19, 2014Date of Patent: November 20, 2018Assignees: Samsung Electronics Co., Ltd, Fairchild Korea Semiconductor Ltd.Inventors: Ku-Chul Jung, Erik Wilson Maier, Oscar Freitas, Kisun Lee, Chul-Eun Yun, Kwang-Sub Lee
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Patent number: 9299643Abstract: An electrically conductive interconnect is provided through an opening in a dielectric layer, electrically connecting two conductive layers. In one embodiment, the interconnect is formed by ruthenium entirely filling the opening in the dielectric layer. In another embodiment, an adhesion layer of titanium is provided in the opening prior to providing the ruthenium. In using this approach, an aspect ratio (i.e., the ratio of the length of the interconnect to the width thereof) of 20:1 or greater is achievable.Type: GrantFiled: September 29, 2008Date of Patent: March 29, 2016Assignee: Cypress Semiconductor CorporationInventors: Zheng Wang, Connie Wang, Erik Wilson, Wen Yu, Robert Chiu
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Publication number: 20150180244Abstract: A method is provided comprising: detecting a connection between an electronic device and a battery charger; transmitting to the battery charger a first request for at least one of a first voltage level and a first current level; receiving from the battery charger a signal; and charging a battery of the electronic device with the signal.Type: ApplicationFiled: December 19, 2014Publication date: June 25, 2015Inventors: Ku-Chul JUNG, Erik Wilson MAIER, Oscar FREITAS, Kisun LEE, Chul-Eun YUN, Kwang-Sub LEE
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Publication number: 20150126983Abstract: An incisionless fully endoscopic method of reducing the capacity of the stomach is provided to surgically treat obesity. The method is directed to endoluminal tissue approximation of a portion of the stomach, including at least a portion of the greater curvature thereof. The method includes a pattern of stitching in which a portion of the stomach is closed off. One stitching pattern causes the lateral portion of the stomach to be drawn to reduce the usable volume of the stomach while maintaining a pathway from the esophagus to the pylorus. As the stitching pattern advances, the fundus is automatically drawn downward so that it may be endoscopically approached for stitching in a facilitated manner. According to another aspect of the invention, another stitching pattern extends from the antrum to the fundus between the anterior and posterior portions of the stomach.Type: ApplicationFiled: October 7, 2014Publication date: May 7, 2015Applicant: APOLLO ENDOSURGERY, INC.Inventors: Alonso Alvarado, Manoel Galvao, Eddie Gomez, Nicole Pena, Sohail Shaikh, Chris Thompson, Erik Wilson, Natan Zundel, Robert Lulo, Ted Stephens
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Patent number: 8415256Abstract: During semiconductor fabrication homogeneous gap-filling is achieved by depositing a thin dielectric layer into the gap, post deposition curing, and then repeating deposition and post deposition curing until gap-filling is completed. Embodiments include depositing a layer of low deposition temperature gap-fill dielectric into a high aspect ratio opening, such as a shallow trench or a gap between closely spaced apart gate electrode structures, as at a thickness of about 10 ? to about 500 ?, curing after deposition, as by UV radiation or by heating at a temperature of about 400° C. to about 1000° C., depositing another layer of low deposition temperature gap-filled dielectric, and curing after deposition. Embodiments include separately depositing and separately curing multiple layers.Type: GrantFiled: December 30, 2010Date of Patent: April 9, 2013Inventors: Alexander Nickel, Lu You, Hirokazu Tokuno, Minh Tran, Minh Van Ngo, Hieu Pham, Erik Wilson, Robert Huertas
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Patent number: 8202810Abstract: A method for forming a single damascene and/or dual damascene, contact and interconnect structure, comprising: performing front end processing, depositing copper including a copper barrier, annealing the copper in at least 90% N2 with less than 10% H2, performing planarization, performing in-situ low-H NH3 plasma treatment and low Si—H SiN etch stop layer deposition, and performing remaining back end processing.Type: GrantFiled: January 9, 2008Date of Patent: June 19, 2012Assignee: Spansion LLCInventors: Alexander H. Nickel, Allen L. Evans, Minh Quoc Tran, Lu You, Minh Van Ngo, Pei-Yuan Gao, William S. Brennan, Erik Wilson, Sung Jin Kim, Hieu Trung Pham
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Patent number: 8026169Abstract: Data retention in flash memory devices, such as mirrorbit devices, is improved by reducing the generation and/or diffusion of hydrogen ions during back end processing, such as annealing inlaid Cu. Embodiments include annealing inlaid Cu in an N2 atmosphere containing low H2 or no H2, and at temperatures less than 200° C., e.g., 100° C. to 150° C.Type: GrantFiled: November 6, 2006Date of Patent: September 27, 2011Assignee: Advanced Micro Devices, Inc.Inventors: Lu You, Alexander Nickel, Minh Q. Tran, Minh-Van Ngo, Hieu Pham, Erik Wilson, Hirokazu Tokuno, Amir Hossein Jafarpour, Inkuk Kang, Robert Huertas
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Patent number: 7884030Abstract: During semiconductor fabrication homogeneous gap-filling is achieved by depositing a thin dielectric layer into the gap, post deposition curing, and then repeating deposition and post deposition curing until gap-filling is completed. Embodiments include depositing a layer of low deposition temperature gap-fill dielectric into a high aspect ratio opening, such as a shallow trench or a gap between closely spaced apart gate electrode structures, as at a thickness of about 10 ? to about 500 ?, curing after deposition, as by UV radiation or by heating at a temperature of about 400° C. to about 1000° C., depositing another layer of low deposition temperature gap-filled dielectric, and curing after deposition. Embodiments include separately depositing and separately curing multiple layers.Type: GrantFiled: April 21, 2006Date of Patent: February 8, 2011Assignee: Advanced Micro Devices, Inc. and Spansion LLCInventors: Alexander Nickel, Lu You, Hirokazu Tokuno, Minh Tran, Minh Van Ngo, Hieu Pham, Erik Wilson, Robert Huertas
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Publication number: 20100270845Abstract: A modular seat frame for a school bus seat includes riser assemblies for supporting the seat fabricated from a moldable material reinforced locally by attachment and reinforcement members.Type: ApplicationFiled: April 28, 2009Publication date: October 28, 2010Applicant: International Truck Intellectual Property Company LLCInventors: Erik Wilson, Yogesh Dattatraya Aundhkar, Atul Prabhakar Khanapurkar, Narasimha Dhanayutham Gupta
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Publication number: 20100078815Abstract: An electrically conductive interconnect is provided through an opening in a dielectric layer, electrically connecting two conductive layers. In one embodiment, the interconnect is formed by ruthenium entirely filling the opening in the dielectric layer. In another embodiment, an adhesion layer of titanium is provided in the opening prior to providing the ruthenium. In using this approach, an aspect ratio (i.e., the ratio of the length of the interconnect to the width thereof) of 20:1 or greater is achievable.Type: ApplicationFiled: September 29, 2008Publication date: April 1, 2010Inventors: Zheng Wang, Connie Wang, Erik Wilson, Wen Yu, Robert Chiu
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Patent number: 7534732Abstract: Cu interconnects are formed with composite capping layers for reduced electromigration, improved adhesion between Cu and the capping layer, and reduced charge loss in associated non-volatile transistors. Embodiments include depositing a first relatively thin silicon nitride layer having a relatively high concentration of Si—H bonds on the upper surface of a layer of Cu for improved adhesion and reduced electromigration, and depositing a second relatively thick silicon nitride layer having a relatively low concentration of Si—H bonds on the first silicon nitride layer for reduced charge loss.Type: GrantFiled: February 17, 2006Date of Patent: May 19, 2009Assignees: Spansion LLC, Advanced Micro Devices, Inc.Inventors: Minh Van Ngo, Erik Wilson, Hieu Pham, Robert Huertas, Lu You, Hirokazu Tokuno, Alexander Nickel, Minh Tran
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Publication number: 20080108193Abstract: Data retention in flash memory devices, such as mirrorbit devices, is improved by reducing the generation and/or diffusion of hydrogen ions during back end processing, such as annealing inlaid Cu. Embodiments include annealing inlaid Cu in an N2 atmosphere containing low H2 or no H2, and at temperatures less than 200° C., e.g., 100° C. to 150° C.Type: ApplicationFiled: November 6, 2006Publication date: May 8, 2008Inventors: Lu You, Alexander Nickel, Minh Q. Tran, Minh-Van Ngo, Hieu Pham, Erik Wilson, Hirokazu Tokuno, Amir Hossein Jafarpour, Inkuk Kang, Robert Huertas