Patents by Inventor Erika Szekeres
Erika Szekeres has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150264922Abstract: The invention relates to polymer-micelle complex. The polymer-micelle complexes include a positively charged micelle selected from the group consisting of a monomeric quaternary ammonium compound, a monomeric biguanide compound, and mixtures thereof. The positively charged micelle is electrostatically bound to a water-soluble polymer bearing a negative charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: ApplicationFiled: May 13, 2015Publication date: September 24, 2015Applicant: THE CLOROX COMPANYInventors: David R. Scheuing, Travers Anderson, Thomas F. Fahlen, William L. Smith, Erika Szekeres, Rui Zhang
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Patent number: 9120999Abstract: The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.Type: GrantFiled: November 13, 2013Date of Patent: September 1, 2015Assignee: The Clorox CompanyInventors: David R. Scheuing, Arun Agarwal, David E. Dabney, Gregory P. Dado, Lafayette D. Foland, Shuman Mitra, Jacqueline M. Pytel, William L. Smith, Erika Szekeres, Michael R. Terry, Kenneth L. Vieira
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Patent number: 9074165Abstract: The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.Type: GrantFiled: March 16, 2015Date of Patent: July 7, 2015Assignee: The Clorox CompanyInventors: David R. Scheuing, Arun Agarwal, David E. Dabney, Gregory P. Dado, Lafayette D. Foland, Shuman Mitra, Jacqueline M. Pytel, William L. Smith, Erika Szekeres, Michael R. Terry, Kenneth L. Vieira
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Patent number: 9074166Abstract: The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.Type: GrantFiled: March 16, 2015Date of Patent: July 7, 2015Assignee: The Clorox CompanyInventors: David R. Scheuing, Arun Agarwal, David E. Dabney, Gregory P. Dado, Lafayette D. Foland, Shuman Mitra, Jacqueline M. Pytel, William L. Smith, Erika Szekeres, Michael R. Terry, Kenneth L. Vieira
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Publication number: 20150184114Abstract: The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.Type: ApplicationFiled: March 16, 2015Publication date: July 2, 2015Applicant: THE CLOROX COMPANYInventors: David R. Scheuing, ARUN AGARWAL, DAVID E. DABNEY, GREGORY P. DADO, LAFAYETTE D. FOLAND, SHUMAN MITRA, JACQUELINE M. PYTEL, WILLIAM L. SMITH, ERIKA SZEKERES, MICHAEL R. TERRY, KENNETH L. VIEIRA
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Publication number: 20150184113Abstract: The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.Type: ApplicationFiled: March 16, 2015Publication date: July 2, 2015Applicant: THE CLOROX COMPANYInventors: DAVID R. SCHEUING, ARUN AGARWAL, DAVID E. DABNEY, GREGORY P. DADO, LAFAYETTE D. FOLAND, SHUMAN MITRA, JACQUELINE M. PYTEL, WILLIAM L. SMITH, ERIKA SZEKERES, MICHAEL R. TERRY, KENNETH L. VIEIRA
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Publication number: 20150133360Abstract: The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.Type: ApplicationFiled: November 13, 2013Publication date: May 14, 2015Applicant: The Clorox CompanyInventors: David R. Scheuing, Arun Agarwal, David E. Dabney, Gregory P. Dado, Lafayette D. Foland, Shuman Mitra, Jacqueline M. Pytel, William L. Smith, Erika Szekeres, Michael R. Terry, Kenneth L. Vieira
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Publication number: 20150133361Abstract: The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.Type: ApplicationFiled: November 13, 2013Publication date: May 14, 2015Applicant: The Clorox CompanyInventors: David R. Scheuing, Arun Agarwal, David E. Dabney, Gregory P. Dado, Lafayette D. Foland, Shuman Mitra, Jacqueline M. Pytel, William L. Smith, Erika Szekeres, Michael R. Terry, Kenneth L. Vieira
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Patent number: 9018153Abstract: The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.Type: GrantFiled: November 13, 2013Date of Patent: April 28, 2015Assignee: The Clorox CompanyInventors: David R. Scheuing, Arun Agarwal, David E. Dabney, Gregory P. Dado, Lafayette D. Foland, Shuman Mitra, Jacqueline M. Pytel, William L. Smith, Erika Szekeres, Michael R. Terry, Kenneth L. Vieira
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Publication number: 20150038392Abstract: The invention relates to a polymer-micelle complex. The polymer-micelle complexes include a negatively charged micelle that is electrostatically bound to a water-soluble polymer bearing a positive charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: ApplicationFiled: October 17, 2014Publication date: February 5, 2015Applicant: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Rui Zhang
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Patent number: 8933010Abstract: The invention relates to polymer-micelle complex. The polymer-micelle complexes include a positively charged micelle selected from the group consisting of a monomeric quaternary ammonium compound, a monomeric biguanide compound, and mixtures thereof. The positively charged micelle is electrostatically bound to a water-soluble polymer bearing a negative charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: GrantFiled: April 3, 2014Date of Patent: January 13, 2015Assignee: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Rui Zhang
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Patent number: 8883705Abstract: The invention relates to polymer-micelle complex. The polymer-micelle complexes include a positively charged micelle selected from the group consisting of a monomeric quaternary ammonium compound, a monomeric biguanide compound, and mixtures thereof. The positively charged micelle is electrostatically bound to a water-soluble polymer bearing a negative charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: GrantFiled: October 30, 2012Date of Patent: November 11, 2014Assignee: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Rui Zhang
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Patent number: 8883706Abstract: The invention relates to a polymer-micelle complex. The polymer-micelle complexes include a negatively charged micelle that is electrostatically bound to a water-soluble polymer bearing a positive charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: GrantFiled: October 30, 2012Date of Patent: November 11, 2014Assignee: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Rui Zhang
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Publication number: 20140296126Abstract: The invention relates to polymer-micelle complex. The polymer-micelle complexes include a positively charged micelle selected from the group consisting of a monomeric quaternary ammonium compound, a monomeric biguanide compound, and mixtures thereof. The positively charged micelle is electrostatically bound to a water-soluble polymer bearing a negative charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: ApplicationFiled: April 3, 2014Publication date: October 2, 2014Applicant: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Rui Zhang
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Patent number: 8765114Abstract: The invention relates to a polymer-micelle complex. The polymer-micelle complexes include a negatively charged micelle that is electrostatically bound to a water-soluble polymer bearing a positive charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: GrantFiled: October 30, 2012Date of Patent: July 1, 2014Assignee: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Rui Zhang
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Patent number: 8728530Abstract: The invention relates to a polymer-micelle complex. The polymer-micelle complexes include a negatively charged micelle that is electrostatically bound to a water-soluble polymer bearing a positive charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: GrantFiled: October 30, 2012Date of Patent: May 20, 2014Assignee: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Rui Zhang
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Patent number: 8728454Abstract: The invention relates to polymer-micelle complex. The polymer-micelle complexes include a positively charged micelle selected from the group consisting of a monomeric quaternary ammonium compound, a monomeric biguanide compound, and mixtures thereof. The positively charged micelle is electrostatically bound to a water-soluble polymer bearing a negative charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: GrantFiled: October 30, 2012Date of Patent: May 20, 2014Assignee: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Rui Zhang
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Publication number: 20140120056Abstract: The invention relates to a polymer-micelle complex, The polymer-micelle complexes include a negatively charged micelle that is electrostatically bound to a water-soluble polymer bearing a positive charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: ApplicationFiled: October 30, 2012Publication date: May 1, 2014Applicant: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, William L. Smith, Erika Szekeres, Riji Zhang
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Publication number: 20140116917Abstract: The invention relates to polymer-micelle complex. The polymer-micelle complexes include a positively charged micelle selected from the group consisting of a monomeric quaternary ammonium compound, a monomeric biguanide compound, and mixtures thereof. The positively charged micelle is electrostatically bound to a water-soluble polymer bearing a negative charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: ApplicationFiled: October 30, 2012Publication date: May 1, 2014Applicant: The Clorox CompanyInventors: David R. Scheuing, TRAVERS ANDERSON, WILLIAM L. SMITH, ERIKA SZEKERES, RUI ZHANG
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Publication number: 20140121281Abstract: The invention relates to polymer-micelle complex. The polymer-micelle complexes include a positively charged micelle selected from the group consisting of a monomeric quaternary ammonium compound, a monomeric biguanide compound, and mixtures thereof. The positively charged micelle is electrostatically bound to a water-soluble polymer bearing a negative charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.Type: ApplicationFiled: October 30, 2012Publication date: May 1, 2014Applicant: The Clorox CompanyInventors: David R. Scheuing, Travers Anderson, Thomas F. Fahlen, William L. Smith, Erika Szekeres, Rui Zhang