Patents by Inventor Eriko Inoue

Eriko Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Work stage of exposing apparatus, exposing method and method of manufacturing a structure
    Patent number: 9158210
    Abstract: At a time of aligning a thin plate-shaped work of which both front and rear surfaces are subjected to work, a deflection caused at a central portion of the thin plate-shaped work is corrected and the thin plate-shaped work is controlled to be parallel state with respect to a photomask.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: October 13, 2015
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventor: Eriko Inoue
  • WORK STAGE OF EXPOSING APPARATUS, EXPOSING METHOD AND METHOD OF MANUFACTURING A STRUCTURE
    Publication number: 20130155382
    Abstract: At a time of aligning a thin plate-shaped work of which both front and rear surfaces are subjected to work, a deflection caused at a central portion of the thin plate-shaped work is corrected and the thin plate-shaped work is controlled to be parallel state with respect to a photomask.
    Type: Application
    Filed: February 15, 2013
    Publication date: June 20, 2013
    Inventor: Eriko INOUE
  • WORK STAGE OF EXPOSING APPARATUS, EXPOSING METHOD AND METHOD OF MANUFACTURING A STRUCTURE
    Publication number: 20100103402
    Abstract: At a time of aligning a thin plate-shaped work of which both front and rear surfaces are subjected to work, a deflection caused at a central portion of the thin plate-shaped work is corrected and the thin plate-shaped work is controlled to be parallel state with respect to a photomask.
    Type: Application
    Filed: February 8, 2006
    Publication date: April 29, 2010
    Applicant: Dai Nippon Printing Co., Ltd
    Inventor: Eriko Inoue