Patents by Inventor Eriko Nishimura

Eriko Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF MANUFACTURING OXIDE FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20080214019
    Abstract: A method of manufacturing an oxide film includes jetting onto a substrate a high-pressure solution containing an oxygen source and having a pressure of 5 MPa, and forming an oxide film on the substrate using the jetted high-pressure solution.
    Type: Application
    Filed: February 29, 2008
    Publication date: September 4, 2008
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi KATSUMATA, Makoto Saito, Hiroshi Fujita, Eriko Nishimura
  • Method of manufacturing oxide film and method of manufacturing semiconductor device
    Publication number: 20060068605
    Abstract: A method of manufacturing an oxide film includes jetting onto a substrate a high-pressure solution containing an oxygen source and having a pressure of 5 MPa, and forming an oxide film on the substrate using the jetted high-pressure solution.
    Type: Application
    Filed: September 23, 2005
    Publication date: March 30, 2006
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Katsumata, Makoto Saito, Hiroshi Fujita, Eriko Nishimura