Patents by Inventor Erin MCDONNELL

Erin MCDONNELL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fabrication of a silicon structure and deep silicon etch with profile control
    Patent number: 9330926
    Abstract: A method of etching features into a silicon layer with a steady-state gas flow is provided. An etch gas comprising an oxygen containing gas and a fluorine containing gas is provided. A plasma is provided from the etch gas. Then, the flow of the etch gas is stopped.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: May 3, 2016
    Assignee: Lam Research Corporation
    Inventors: Robert Chebi, Frank Lin, Jaroslaw W. Winniczek, Wan-Lin Chen, Erin McDonnell, Lily Zheng, Stephan Lassig, Jeff Bogart, Camelia Rusu
  • FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFILE CONTROL
    Publication number: 20090184089
    Abstract: A method of etching features into a silicon layer with a steady-state gas flow is provided. An etch gas comprising an oxygen containing gas and a fluorine containing gas is provided. A plasma is provided from the etch gas. Then, the flow of the etch gas is stopped.
    Type: Application
    Filed: December 18, 2008
    Publication date: July 23, 2009
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Robert CHEBI, Frank LIN, Jaroslaw W. WINNICZEK, Wan-Lin CHEN, Erin MCDONNELL, Lily ZHENG, Stephan LASSIG, Jeff BOGART, Camelia RUSU