Abstract: A method of removing contaminants from a double-ended arc discharge tube includes the steps of providing at least one capillary channel at each end of the tube, where the ends of the tube are sealed closed except at the capillary channels, and introducing a flushing gas into the tube through one capillary channel at one end of the tube and removing the flushing gas and contaminants through another capillary channel at another end of the tube. During manufacture, the double-ended arc discharge tube has a sealed electrode and an open capillary channel at each end of the tube.

Abstract: A method of removing contaminants from a double-ended arc discharge tube includes the steps of providing at least one capillary channel at each end of the tube, where the ends of the tube are sealed closed except at the capillary channels, and introducing a flushing gas into the tube through one capillary channel at one end of the tube and removing the flushing gas and contaminants through another capillary channel at another end of the tube. During manufacture, the double-ended arc discharge tube has a sealed electrode and an open capillary channel at each end of the tube.

Abstract: A method of removing contaminants from a double-ended arc discharge tube includes the steps of providing at least one capillary channel at each end of the tube, where the ends of the tube are sealed closed except at the capillary channels, and introducing a flushing gas into the tube through one capillary channel at one end of the tube and removing the flushing gas and contaminants through another capillary channel at another end of the tube. During manufacture, the double-ended arc discharge tube has a sealed electrode and an open capillary channel at each end of the tube.

Abstract: A high pressure, lamp may be made in a pressure vessel by using an induction coil to melt an edge portion of a sealing wafer pressed against the circumference of an opening in the body of the lamp envelope. The pressure vessel and the lamp envelope are filled with desired fill materials. Induction heating is carried out by the induction coil and induction receiver that presses against the wafer, the lamp envelope or both to hold the melting piece or pieces in contact. The induction receiver may be fused to the lamp body forming a functional part of the overall lamp structure. The preferred resulting lamp includes a bonded metal piece that can be conveniently used for electrical or mechanical coupling or positioning of the lamp with respect to a base.

Abstract: A high pressure, lamp may be made in a pressure vessel by using an induction coil to melt an edge portion of a sealing wafer pressed against the circumference of an opening in the body of the lamp envelope. The pressure vessel and the lamp envelope are filled with desired fill materials. Induction heating is carried out by the induction coil and induction receiver that presses against the wafer, the lamp envelope or both to hold the melting piece or pieces in contact. The induction receiver may be fused to the lamp body forming a functional part of the overall lamp structure. The preferred resulting lamp includes a bonded metal piece that can be conveniently used for electrical or mechanical coupling or positioning of the lamp with respect to a base.

Abstract: A method of removing contaminants from a double-ended arc discharge tube includes the steps of providing at least one capillary channel at each end of the tube, where the ends of the tube are sealed closed except at the capillary channels, and introducing a flushing gas into the tube through one capillary channel at one end of the tube and removing the flushing gas and contaminants through another capillary channel at another end of the tube. During manufacture, the double-ended arc discharge tube has a sealed electrode and an open capillary channel at each end of the tube.

Abstract: A high pressure, lamp may be made in a pressure vessel by using an induction coil to melt an edge portion of a sealing wafer pressed against the circumference of an opening in the body of the lamp envelope. The pressure vessel and the lamp envelope are filled with desired fill materials. Induction heating is carried out by the induction coil and induction receiver that presses against the wafer, the lamp envelope or both to hold the melting piece or pieces in contact. The induction receiver may be fused to the lamp body forming a functional part of the overall lamp structure. The preferred resulting lamp includes a bonded metal piece that can be conveniently used for electrical or mechanical coupling or positioning of the lamp with respect to a base.

Abstract: A high pressure, lamp may be made in a pressure vessel by using an induction coil to melt an edge portion of a sealing wafer pressed against the circumference of an opening in the body of the lamp envelope. The pressure vessel and the lamp envelope are filled with desired fill materials. Induction heating is carried out by the induction coil and induction receiver that presses against the wafer, the lamp envelope or both to hold the melting piece or pieces in contact. The induction receiver may be fused to the lamp body forming a functional part of the overall lamp structure. The preferred resulting lamp includes a bonded metal piece that can be conveniently used for electrical or mechanical coupling or positioning of the lamp with respect to a base.

Abstract: An improved hermetic seal means for use in an electroluminescent display device for joining the protective cover sheet (glass) over the base substrate. The base substrate has typically deposited thereon multiple thin film layers. The hermetic seal comprises an electrically insulative thin film layer disposed over the conductive thin film leads associated with the multiple thin film layers, and metallic solder means over the insulative thin film layer to provide a bond between the cover sheet and base substrate.

Abstract: A sputtering cathode apparatus for the deposition of thin films which are produced at a relatively high deposition rate. A relatively large planar magnetron sputtering system or apparatus is provided with a preferred single convoluted electron path so as to obtain high geometric efficiency. The target is larger than the substrate and the substrate motion is confined to an area within the defined target area. The cathode system requires a vacuum system of relatively small dimension due to the increase in target size in comparison with substrate size along with the provision for multiple plasma legs separated by non-emissive regions therebetween. This construction enables minimized substrate motion relative to the target.

Abstract: The deposition of thin films is carried out by a co-sputtering cathode technique particularly suited for deposition of doped thin films on large area substrates. A relatively large planar magnetron sputtering apparatus having a rectangular (picture frame shaped) plasma region is provided to obtain efficient sputtering of the host material. A vacant center area defined by the plasma region is provided for diode sputtering of the dopant. In RF sputtering, co-excitation of the power source is desired to prevent RF mode beating.

Abstract: In an evaporation source for the vacuum deposition of sublimating material, the evaporant surrounds, and is spaced from, an axially disposed coiled tungsten heater. The evaporated material passes out of the source in an upward direction to deposit on a substrate located above the source.