Abstract: A coated cutting tool for chip forming machining of metals includes a substrate having a surface coated with a chemical vapour deposition (CVD) coating. The substrate is coated with a coating having a layer of ?-Al2O3, wherein the ?-Al2O3 layer exhibits a texture coefficient TC(0 0 12)?7.2 and wherein the ratio of I(0 0 12)/I(0 1 14)?0.8. The coating further includes a MTCVD TiCN layer located between the substrate and the ?-Al2O3 layer. The MTCVD TiCN layer exhibits a pole figure, as measured by EBSD, in a portion of the MTCVD TiCN layer parallel to the outer surface of the coating and less than 1 ?m from the outer surface of the MTCVD TiCN, wherein a pole plot based on the data of the pole figure, with a bin size of 0.25° over a tilt angle range of 0°???45° from the normal of the outer surface of the coating shows a ratio of intensity within ??15° tilt angle to the intensity within 0°???45° of ?45%.

Abstract: A coated cutting tool for chip forming machining of metals includes a substrate having a surface coated with a chemical vapour deposition (CVD) coating. The substrate is coated with a coating having a layer of ?-Al2O3, wherein the ?-Al2O3 layer exhibits a texture coefficient TC(0 0 12)?7.2 and wherein the ratio of I(0 0 12)/I(0 1 14)?0.8. The coating further includes a MTCVD TiCN layer located between the substrate and the ?-Al2O3 layer. The MTCVD TiCN layer exhibits a pole figure, as measured by EBSD, in a portion of the MTCVD TiCN layer parallel to the outer surface of the coating and less than 1 ?m from the outer surface of the MTCVD TiCN, wherein a pole plot based on the data of the pole figure, with a bin size of 0.25° over a tilt angle range of 0°???45° from the normal of the outer surface of the coating shows a ratio of intensity within ??15° tilt angle to the intensity within 0°???45° of ?45%.

Abstract: The present invention relates to methods for determining the sequence bias of a sequencing technique. Furthermore, the invention relates to methods to reduce or enhance sequence bias during sequencing of nucleic acids via techniques involving adaptor ligations. Specifically the method relates to use of a degenerate RNA sequence to analyze sequence bias when generating small RNA libraries, and to the use of modified adaptors for cloning of small RNAs with degenerate or specific sequences to reduce or enhance sequencing bias, as well as various nucleic acid molecules relating thereto or derived therefrom.

Abstract: The present invention relates to methods for determining the sequence bias of a sequencing technique. Furthermore, the invention relates to methods to reduce or enhance sequence bias during sequencing of nucleic acids via techniques involving adaptor ligations. Specifically the method relates to use of a degenerate RNA sequence to analyse sequence bias when generating small RNA libraries, and to the use of modified adaptors for cloning of small RNAs with degenerate or specific sequences to reduce or enhance sequencing bias, as well as various nucleic acid molecules relating thereto or derived therefrom.