Patents by Inventor Ernst-August Hackmann

Ernst-August Hackmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation-sensitive recording material with a positive-working, radiation-sensitive layer having a rough surface containing a surfactant having polysiloxane units
    Patent number: 5378584
    Abstract: A radiation-sensitive recording material, in particular for producing planographic printing plates, is disclosed. The material is composed of a layer support and a positive-working, radiation-sensitive layer having a rough surface containing at least one 1,2-quinonediazide as a radiation-sensitive compound, a polycondensate or polymer as a binder insoluble in water and soluble or swellable in aqueous-alkaline solutions, a dye and a filler. At a layer weight of 3 g/m.sup.2 or less, the radiation-sensitive layer comprises a silicic acid product having a mean grain size in the range from 3 to 5 .mu.m with an exclusion limit of 15 .mu.m as a filler in such a quantity that it exhibits a Bekk smoothness in the range from 20 to 100 seconds (determined according to DIN 53 107, Method A). The layer additionally comprises a surfactant having polysiloxane units.
    Type: Grant
    Filed: August 4, 1992
    Date of Patent: January 3, 1995
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans W. Frass, Ernst-August Hackmann, Klaus Joerg, Dietmar Koenneke, Rudolf Neubauer, Andreas Elsaesser