Abstract: A method for producing a diffractive optical element and a diffractive optical element are disclosed. In an embodiment a method for producing a diffractive optical element includes generating a surface structure by implanting ions into a material of a substrate, a layer or a layer system, wherein the surface structure includes a structure height of less than 10 nm.

Abstract: The present invention relates to the creation of a diffractive element that has a high degree of wavefront flatness. The diffractive element has a flat functional substrate with a first side, whereby a fine structure is arranged on or in this first side, and whereby the first side of this functional substrate is arranged on a flat carrier substrate, whereby the carrier substrate has a higher degree of rigidity than the functional substrate.

Abstract: The present invention relates to a security element (20) for security papers, value documents and the like, having a feature region (24) that selectively influences incident electromagnetic radiation (30). According to the present invention, it is provided that the feature region (24) includes metallic nanopatterns (28) in which volume or surface plasmons are excited and/or resonance effects are caused by the incident electromagnetic radiation (30).

Abstract: A diffraction grating includes a grating area having, in a direction running parallel to a substrate, a periodic arrangement of first areas with a first grating material and second areas with a second grating material. The first grating material and the second grating material are solid materials with different indices of refraction. A reflection-reducing or reflection-increasing layer system having at least two layers with different indices refraction. The reflection-reducing or reflection-increasing layer system is arranged on one side of the grating area facing away from the substrate, and an additional layer system having at least two layers with different indices of refraction is arranged between the substrate and the grating area. A method for producing the diffraction grating is also specified.

Abstract: A diffractive optical element generates a phase distribution with an arbitrary quasi-continuous phase deviation. The diffractive optical element includes a plurality of pixels configured to generate an adjustable phase deviation. Each pixel has a base face, and the plurality of pixels being disposed adjacent each other with their base faces in an element plane of the diffractive optical element. One or more pixels of the plurality of pixels includes a height profile formed by a first face and a second face of the one or more pixels. A distance between the first face and second face defining a height step that is tuned to an adjustable maximum phase deviation of the diffractive optical element.

Abstract: A semiconductor component that includes a photosensitive doped semiconductor layer, in which electrical charge carriers are released during absorption of electromagnetic radiation is disclosed. The photosensitive semiconductor layer has a structured interface and at least one layer which generates an electric field for separating the released charge carriers disposed downstream of the structured interface. The electric field extends over the structured interface. The photosensitive semiconductor component is distinguished by a high efficiency of the charge carrier separation, in particular, for generating an electric current.

Abstract: The present invention relates to the creation of a diffractive element that has a high degree of wavefront flatness. The diffractive element has a flat functional substrate with a first side, whereby a fine structure is arranged on or in this first side, and whereby the first side of this functional substrate is arranged on a flat carrier substrate, whereby the carrier substrate has a higher degree of rigidity than the functional substrate.

Abstract: The present invention relates to a security element (20) for security papers, value documents and the like, having a feature region (24) that selectively influences incident electromagnetic radiation (30). According to the present invention, it is provided that the feature region (24) includes metallic nanopatterns (28) in which volume or surface plasmons are excited and/or resonance effects are caused by the incident electromagnetic radiation (30).

Abstract: A semiconductor component that includes a photosensitive doped semiconductor layer, in which electrical charge carriers are released during absorption of electromagnetic radiation is disclosed. The photosensitive semiconductor layer has a structured interface and at least one layer which generates an electric field for separating the released charge carriers disposed downstream of the structured interface. The electric field extends over the structured interface. The photosensitive semiconductor component is distinguished by a high efficiency of the charge carrier separation, in particular, for generating an electric current.

Abstract: A secured document contains at least two sets of information on an information layer, the sets of information providing different informational contents when the data carrier is viewed from different angles. The document contains an optically active microstructure having at least two different regions which are transparent, wherein one region has a diffraction structure and the other region is free of diffraction structures. The sets of information which are to be read are disposed in regions beneath the microstructure. The microstructure may comprise a hologram-like sheet in which a grid-like diffraction structure is embossed by means of an embossing punch.

Abstract: The object of a process and an arrangement for producing dose profiles for the fabrication of structured surfaces with a beam which is used for exposure and is directed on the surface consists in arranging the surface irradiation in such a way that the processing times and material outlay required for fabrication of micro-lenses and micro-lens arrays can be substantially reduced. According to the invention, the beam has at least one shaped region in cross section, which shaped region is movable relative to the surface and whose extent in the movement direction of the relative movement, in combination with the velocity of the relative movement, determines the dose. Effective lithographic fabrication of lens structures, in particular micro-lenses and micro-lens arrays, can be realized with the invention.

Abstract: In a stepped lens with a Fresnel surface structure produced by lithography and a process for fabricating same, the high potential exposure speed of high-speed electron-beam exposure systems which work with variable rectangular beam cross sections is converted in such a way that stepped Fresnel type lenses can be fabricated with high efficiency and, in so doing, the required amounts of data is reduced. According to the invention, radiation dose distributions which correspond to cylindrical lenses are exposed one upon the other, at least one of the radiation dose distributions corresponding to a Fresnel type cylindrical lens.Lens structures with any desired lens curvature, from radially spherical to elliptical, can be efficiently produced by lithography by the disclosed process.