Patents by Inventor Ernst Haas

Ernst Haas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5998689
    Abstract: A method for recycling metal parts contaminated by radioactive elements, in particular by .alpha.-emitters, includes forming a melt and a slag from the metal parts and then separating the slag from the melt. The radioactive elements are oxidized prior to the formation of the melt and the slag. For that purpose, the contaminated metal parts are exposed to an oxygen-containing atmosphere for a period at a temperature below the melting temperature of the metal parts.
    Type: Grant
    Filed: June 15, 1998
    Date of Patent: December 7, 1999
    Assignee: Siemens Aktiengesellschaft
    Inventors: Ernst Haas, Nikolaus Neudert, Roland Hofmann
  • Patent number: 5732366
    Abstract: A method for reprocessing metal parts that are radioactively contaminated with uranium includes smelting the metal parts so that a melt and a slag are formed. U.sub.235 -depleted uranium is admixed with the metal parts and/or the melt and/or the slag. It is contemplated for the U.sub.235 -depleted uranium to be admixed in the form of uranium glass.
    Type: Grant
    Filed: February 3, 1997
    Date of Patent: March 24, 1998
    Assignee: Siemens Aktiengesellschaft
    Inventor: Ernst Haas
  • Patent number: 5198128
    Abstract: A waste disposal site, such as an ultimate disposal site for radioactive substances, includes installed waste having hollow spaces remaining therebetween. Packing material fills the remaining spaces. At least one substance to which gaseous toxic substances such as radioactive gases adhere, is admixed with the packing material.
    Type: Grant
    Filed: June 5, 1991
    Date of Patent: March 30, 1993
    Assignee: Siemens Aktiengesellschaft
    Inventors: Hellmuth Beyer, Ernst Haas
  • Patent number: 4119441
    Abstract: A method is disclosed for the production of n-doped silicon single crystals, each having a dish-shaped specific electrical resistance profile in a radial direction about a central axis of the crystal. A silicon single crystal is exposed to a pattern of radiation with neutrons according to the reaction 30.sub.Si (n,.gamma.) 31.sub.Si .sup..beta.-.fwdarw. 31.sub.P. The neutron radiation causes a weaker doping concentration in marginal regions of the crystals due to the production of fewer phosphorus atoms. Either p-conductive silicon crystals or n-conductive silicon crystals may be utilized as an initial material for exposure to the neutron radiation.
    Type: Grant
    Filed: October 12, 1976
    Date of Patent: October 10, 1978
    Assignee: Siemens Aktiengesellschaft
    Inventors: Ernst Haas, Karl Platzoeder, Manfred Schnoeller
  • Patent number: 4048508
    Abstract: An apparatus for doping a semiconductor crystalline rod by nuclear or radiogenic reactions comprised of a hollow irradiation housing having axially and rotatably movable rod support means within the chamber thereof and a neutron conductive sleeve connected with the housing and providing communication between a neutron source and the housing chamber. Accurate and controlled doping of a semiconductor crystalline rod mounted on the rod support means within the housing chamber occurs via controlled rod movement in relation to the neutron source.
    Type: Grant
    Filed: August 11, 1975
    Date of Patent: September 13, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Joachim Martin, Ernst Haas, Manfred Schnoeller
  • Patent number: 4042454
    Abstract: Si monocrystals of the n-type are produced by zone melting polycrystalline Si rods under conditions sufficient to produce monocrystal rods, measuring the specific conductivity of such monocrystal rods and subjecting such monocrystal rods to a controlled radiation by thermal neutrons based on the measured conductivity to produce a desired degree of n-conductivity in the ultimately attained rods.
    Type: Grant
    Filed: November 6, 1974
    Date of Patent: August 16, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Ernst Haas, Joachim Martin, Konrad Reuschel, Manfred Schnoeller
  • Patent number: 4025365
    Abstract: A homogeneously doped p-conductive semiconductor material is produced by irradiating a desired semiconductor material with .gamma.-photons which trigger nuclear reactions within such irradiated material to form dopant atoms therein.
    Type: Grant
    Filed: August 11, 1975
    Date of Patent: May 24, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Joachim Martin, Ernst Haas, Konrad Reuschel, Manfred Schnoller
  • Patent number: 3967982
    Abstract: A semiconductor layer, such as an epitaxial layer on a suitable substrate is subjected to controlled bombardment by neutrons whereby the atoms of the semiconductor layer are converted via nuclear reaction into doping material atoms.
    Type: Grant
    Filed: July 11, 1975
    Date of Patent: July 6, 1976
    Assignee: Siemens Aktiengesellschaft
    Inventors: Heinz-Herbert Arndt, Joachim Burtscher, Gustav Fischer, Ernst Haas, Joachim Martin, Gunter Raab, Manfred Schnoeller