Patents by Inventor Ernst Habekotte

Ernst Habekotte has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Data path for lithography apparatus
    Patent number: 9305747
    Abstract: The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.
    Type: Grant
    Filed: November 7, 2011
    Date of Patent: April 5, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marco Jan-Jaco Wieland, Teunis Van De Peut, Floris Pepijn Van Der Wilt, Ernst Habekotte
  • DATA PATH FOR LITHOGRAPHY APPARATUS
    Publication number: 20120287410
    Abstract: The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.
    Type: Application
    Filed: November 7, 2011
    Publication date: November 15, 2012
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marco Jan-Jaco Wieland, Teunis Van De Peut, Floris Pepijn Van Der Wilt, Ernst Habekotte
  • Modulator circuitry
    Patent number: 7019908
    Abstract: The invention relates to a modulator for modulating the magnitude of a beamlet in a multi-beamlet lithography system, said modulator comprising at least one means for influencing the direction of a beamlet, a light sensitive element for receiving light from a modulated light beam and converting said light into a signal, and discretizing means, coupling to said light sensitive element and to at least one of means for influencing, for converting said signal received from said light sensitive element into a discrete signal having discrete values selected from a set of predefined discrete values and providing said discrete signal to said means for influencing.
    Type: Grant
    Filed: July 29, 2004
    Date of Patent: March 28, 2006
    Assignee: Mapper Lithography IP B.V.
    Inventors: Johannes Christiaan van 't Spijker, Marco Jan-Jaco Wieland, Ernst Habekotte, Floris Pepijn van der Wilt
  • Modulator circuitry
    Publication number: 20050062950
    Abstract: The invention relates to a modulator for modulating the magnitude of a beamlet in a multi-beamlet lithography system, said modulator comprising at least one means for influencing the direction of a beamlet, a light sensitive element for receiving light from a modulated light beam and converting said light into a signal, and discretizing means, coupling to said light sensitive element and to at least one of means for influencing, for converting said signal received from said light sensitive element into a discrete signal having discrete values selected from a set of predefined discrete values and providing said discrete signal to said means for influencing.
    Type: Application
    Filed: July 29, 2004
    Publication date: March 24, 2005
    Inventors: Johannes van 't Spijker, Marco Wieland, Ernst Habekotte, Floris van der Wilt