Patents by Inventor Erping QU
Erping QU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12026898Abstract: A method for image fusion may include obtaining a first image including a plurality of first pixels and a second image including a plurality of second pixels. Each of the plurality of second pixels may correspond to one of the plurality of first pixels. The method may further include classifying the plurality of first pixels into different categories which at least includes a first category and a second category. The method may further include fusing the first image with the second image based on a fusion operation between each of the plurality of first pixels and its corresponding second pixel to generate a fused image. The fusion operation associated with a first pixel belonging to the first category and the fusion operation associated with a first pixel belonging to the second category are performed according to different fusion rules.Type: GrantFiled: May 25, 2021Date of Patent: July 2, 2024Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventor: Erping Qu
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Patent number: 11539897Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.Type: GrantFiled: February 5, 2021Date of Patent: December 27, 2022Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Erping Qu, Qianfeng Huang, Runfa Pan, Liangcheng Li
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Publication number: 20210279530Abstract: A method for image fusion may include obtaining a first image including a plurality of first pixels and a second image including a plurality of second pixels. Each of the plurality of second pixels may correspond to one of the plurality of first pixels. The method may further include classifying the plurality of first pixels into different categories which at least includes a first category and a second category. The method may further include fusing the first image with the second image based on a fusion operation between each of the plurality of first pixels and its corresponding second pixel to generate a fused image. The fusion operation associated with a first pixel belonging to the first category and the fusion operation associated with a first pixel belonging to the second category are performed according to different fusion rules.Type: ApplicationFiled: May 25, 2021Publication date: September 9, 2021Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventor: Erping QU
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Publication number: 20210160417Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.Type: ApplicationFiled: February 5, 2021Publication date: May 27, 2021Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Erping QU, Qianfeng HUANG, Runfa PAN, Liangcheng LI
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Patent number: 10924684Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.Type: GrantFiled: April 26, 2019Date of Patent: February 16, 2021Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Erping Qu, Qianfeng Huang, Runfa Pan, Liangcheng Li
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Publication number: 20190253601Abstract: The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained, The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.Type: ApplicationFiled: April 26, 2019Publication date: August 15, 2019Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.Inventors: Erping QU, Qianfeng HUANG, Runfa PAN, Liangcheng LI