Patents by Inventor Errol A. C. Sanchez

Errol A. C. Sanchez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron beam treatment of SixNy films
    Publication number: 20040266123
    Abstract: One embodiment of the present invention is a method for treating silicon nitride (SixNy) films that includes electron beam treating the silicon nitride film.
    Type: Application
    Filed: April 13, 2004
    Publication date: December 30, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Zhenjiang Cui, Jun Zhao, Rick J. Roberts, Shulin Wang, Errol A. C. Sanchez, Aihua Chen
  • Emissivity-change-free pumping plate kit in a single wafer chamber
    Patent number: 6582522
    Abstract: Provided herein is an emissivity-change-free pumping plate kit used in a single wafer chamber. This kit comprises a top open pumping plate, and optionally a skirt and/or a second stage choking plate. The skirt may be installed around the wafer heater, underneath the wafer heater, or along the chamber body inside the chamber. The choking plate is installed downstream of the top open pumping plate along the purge gas flow. Also provided is a method of preventing emissivity change and further providing optimal film thickness uniformity during wafer processing by utilizing such kit in the chamber.
    Type: Grant
    Filed: March 2, 2001
    Date of Patent: June 24, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Lee Luo, Henry Ho, Shulin Wang, Binh Hoa Tran, Alexander Tam, Errol A. C. Sanchez, Xianzhi Tao, Steven A. Chen