Abstract: According to various embodiments, there is a method of inspecting semiconductor wafers comprising comparing a value for each wafer in a lot of wafers to a mathematical model, where the values include data about at least one feature on the wafers, and where the mathematical model comprises a threshold value corresponding to the at least one feature, and further where values greater than the threshold value comprise an indication of a spin defect. The method can also comprise determining whether any of the values of the wafers in the lot are not greater than the threshold value, grouping into a group (P) those wafers whose values are not greater than the threshold value, and flagging for further inspection those wafers having values greater than the threshold value.

Abstract: An atomic spectroscopy surface burner, includes a housing having at least one channel for carrying fuel and at least one separate channel for carrying oxidant formed therein, the housing having an upper surface with two elongated slots formed therein, each of the slots being in communication with a respective one of the channels for delivering fuel and oxidant separately to the surface, and means for delivering a nebulized sample to the surface through one of the channels.