Patents by Inventor Erwin Antonius Henricus Fransiscus Van Den Boogaert

Erwin Antonius Henricus Fransiscus Van Den Boogaert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus with actuator to compensate acoustic vibration
    Patent number: 9378722
    Abstract: A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: June 28, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Marc Wilhelmus Maria Van der Wijst, Johan Hendrik Geerke, Peter Paul Hempenius, Youssef Karel Maria De Vos, Joost De Pee, Clementius Andreas Johannes Beijers, Nicolaas Bernardus Roozen, Erwin Antonius Henricus Fransiscus Van den Boogaert, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme
  • Lithographic apparatus, method and device manufacturing method
    Patent number: 8310651
    Abstract: In an embodiment, a lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a passive noise damper configured to dampen gas borne noise caused by movement of a movable part of the lithographic apparatus.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: November 13, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Hempenius, Johan Hendrik Geerke, Youssef Karel Maria De Vos, Nicolaas Bernardus Roozen, Erwin Antonius Henricus Fransiscus Van Den Boogaert, Alexander Cornelis Geerlings
  • LITHOGRAPHIC APPARATUS
    Publication number: 20090195763
    Abstract: A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
    Type: Application
    Filed: December 10, 2008
    Publication date: August 6, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Johan Hendrik Geerke, Peter Paul Hempenius, Youssef Karel Maria De Vos, Joost De Pee, Clementius Andreas Johannes Beijers, Nicolaas Bernardus Roozen, Erwin Antonius Henricus Fransiscus Van Den Boogaert, Marco Hendrikus Hermanus Oude Nijhuis, Francois Xavier Debiesme