Abstract: A photomask structure with an anti-electrostatic-discharge (Anti-ESD) ability. The photomask structure comprises a photomask, a conductive dust pellicle, a conductive frame and a conductive film. The photomask possesses a first surface and a pattern is located on the first surface. The conductive dust pellicle is coupled with the photomask through the conductive frame and the pattern is enclosed by the conductive dust pellicle, the conductive frame and the photomask. The conductive film covers a surface of the photomask uncovered by the conductive dust pellicle and the conductive frame. The conductive dust pellicle, the conductive frame and the conductive film constitute a conductive structure enclosing the photomask.