Patents by Inventor Erwin E. Grund

Erwin E. Grund has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silicon nitride etch bath system
    Patent number: 6207068
    Abstract: An improved silicon nitride etch bath system is provided. The improved etch bath system includes a silicon dioxide condensing system formed of a heat exchanger and a secondary filter. The heat exchanger is provided for removing a small portion of phosphoric acid from an etching bath and for cooling of the same. The secondary filter is used for extracting silicon dioxide particles in the small portion of the phosphoric acid and is operatively connected to the heat exchanger before returning the same to the etching bath. In this manner, the concentration of silicon dioxide in the etching bath will be prevented from being saturated.
    Type: Grant
    Filed: November 18, 1998
    Date of Patent: March 27, 2001
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Jeffrey S. Glick, Erwin E. Grund