Patents by Inventor Esmeralda Yitamben

Esmeralda Yitamben has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Shared data induced quality control for a chemical mechanical planarization process
    Patent number: 12205061
    Abstract: A method for developing or improving a process for producing a product from a material comprising steps of acquiring the composition for at least two slurries as raw material data (17) for the CMP based manufacturing process and its relevant parameters (2) by using a Data Collecting computer (9); physically performing specific method steps of a CMP process; measuring relevant parameters of the used slurries and the physically performed CMP process to determine the CMP process performance by using the Data Collecting computer (9); analyzing the measured data about the relevant parameters with a specific software performed on an Analyzing computer (11) by creating for the software and applying with it a predictive model using Machine Learning to understand the intercorrelation of the different parameters and using the results to improve the CMP process performance and the resulting product quality of the CMP based manufacturing process.
    Type: Grant
    Filed: May 18, 2022
    Date of Patent: January 21, 2025
    Assignee: Versum Materials US, LLC
    Inventors: Cesar Clavero, Vid Gopal, Ryan Clarke, Esmeralda Yitamben, Hieu Pham, Anupama Mallikarjunan, Rung-Je Yang, Shirley Lin, Hongjun Zhou, Joseph Rose, Krishna Murella, Lu Gan
  • Shared Data Induced Quality Control For A Chemical Mechanical Planarization Process
    Publication number: 20230325751
    Abstract: A method for developing or improving a process for producing a product from a material comprising steps of acquiring the composition for at least two slurries as raw material data (17) for the CMP based manufacturing process and its relevant parameters (2) by using a Data Collecting computer (9); physically performing specific method steps of a CMP process; measuring relevant parameters of the used slurries and the physically performed CMP process to determine the CMP process performance by using the Data Collecting computer (9); analyzing the measured data about the relevant parameters with a specific software performed on an Analyzing computer (11) by creating for the software and applying with it a predictive model using Machine Learning to understand the intercorrelation of the different parameters and using the results to improve the CMP process performance and the resulting product quality of the CMP based manufacturing process.
    Type: Application
    Filed: May 18, 2022
    Publication date: October 12, 2023
    Applicant: Versum Materials US, LLC
    Inventors: Cesar Clavero, Vid Gopal, Ryan Clarke, Esmeralda Yitamben, Hieu Pham, Anupama Mallikarjunan, Rung-Je Yang, Shirley Lin, Hongjun Zhou, Joseph Rose, Krishna Murella, Lu Gan