Abstract: A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR.

Abstract: A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR.

Abstract: A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR.

Abstract: A method and system for fracturing or mask data preparation is disclosed in which the central core portion of a diagonal pattern is fractured using overlapping variable shaped beam (VSB) shots, and an outer portion of the diagonal pattern is fractured using non-overlapping VSB shots. A transition region is interposed between the central core and outer pattern portions, and transition region shots are generated so as to produce in the transferred pattern a smooth transition in pattern characteristics such as line edge roughness or period of waviness, from the central core portion of the pattern to the outer portion of the pattern. A pattern determined by the transition region shots is then compared to a reticle pattern created using conventional non-overlapping VSB shots. Methods for forming a semiconductor device layout pattern on a reticle or substrate are also disclosed.

Abstract: A method and system for fracturing or mask data preparation is disclosed in which the central core portion of a diagonal pattern is fractured using overlapping variable shaped beam (VSB) shots, and an outer portion of the diagonal pattern is fractured using non-overlapping VSB shots. A transition region is interposed between the central core and outer pattern portions, and transition region shots are generated so as to produce in the transferred pattern a smooth transition in pattern characteristics such as line edge roughness or period of waviness, from the central core portion of the pattern to the outer portion of the pattern. Methods for forming a semiconductor device layout pattern on a reticle or substrate are also disclosed.

Abstract: A method and system for fracturing or mask data preparation is disclosed in which the central core portion of a diagonal pattern is fractured using overlapping variable shaped beam (VSB) shots, and an outer portion of the diagonal pattern is fractured using non-overlapping VSB shots. A transition region is interposed between the central core and outer pattern portions, and transition region shots are generated so as to produce in the transferred pattern a smooth transition in pattern characteristics such as line edge roughness or period of waviness, from the central core portion of the pattern to the outer portion of the pattern. A pattern determined by the transition region shots is then compared to a reticle pattern created using conventional non-overlapping VSB shots. Methods for forming a semiconductor device layout pattern on a reticle or substrate are also disclosed.

Abstract: A method and system for fracturing or mask data preparation is disclosed in which the central core portion of a diagonal pattern is fractured using overlapping variable shaped beam (VSB) shots, and an outer portion of the diagonal pattern is fractured using non-overlapping VSB shots. A transition region is interposed between the central core and outer pattern portions, and transition region shots are generated so as to produce in the transferred pattern a smooth transition in pattern characteristics such as line edge roughness or period of waviness, from the central core portion of the pattern to the outer portion of the pattern. Methods for forming a semiconductor device layout pattern on a reticle or substrate are also disclosed.

Abstract: A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR.

Abstract: A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR.

Abstract: A method for matching of two detailed patterns is disclosed in which abstracts of each of the detailed patterns are created, where the abstracts are less complex than the detailed patterns. The abstracts are then compared to determine if the detailed patterns may possibly match, where comparison of the abstracts is faster than comparison of the detailed patterns. If comparison of the abstracts indicates a possible match, then the detailed patterns are compared, otherwise no detailed pattern comparison is needed.

Abstract: Some embodiments of the invention provide a Local Preferred Direction (LPD) wiring model for use with one or more EDA tools (such as placing, routing, etc). An LPD wiring model allows at least one wiring layer to have a set of regions that each have a different preferred direction than the particular wiring layer. In addition, each region has a local preferred direction that differs from the local preferred direction of at least one other region in the set. Furthermore, at least two regions have two different polygonal shapes and no region in the set encompasses another region in the set. Some embodiments also provide a Graphical User Interface (GUI) that facilitates a visual presentation of an LPD design layout and provides tools to create and manipulate LPD regions in a design layout.

Abstract: A method is provided that performs a path search that identifies several path extensions. The method performs a viability check on a particular path extension by identifying first and second circuit geometries. The first circuit geometry is associated with a particular segment of a route that would result from the particular path expansion in a design layout. The second circuit geometry is associated with a circuit element to which the particular segment connects. The viability check also determines whether connecting the segment with the first geometry and the circuit element with the second geometry is allowable based on predetermined rules. The method stores the particular path expansion in a storage medium as a viable path expansion when the viability check determines that connecting the segment with the first geometry and the circuit element with the second geometry is allowable.

Abstract: Some embodiments of the invention provide a router that can define a route that has different widths along different directions on the same layer. To facilitate the creation of such a route, some embodiments adaptively define the shape of interconnect-line ends (i.e., the shape of route-segment ends) on a particular layer based on the routing directions available on the particular layer. By so defining these shapes, these embodiments improve the alignment of route segments that have differing widths. In other words, dynamically defining the interconnect-line ends improves the shape of a route at bends along which the route transition from one width to another. Also, to facilitate the creation of a route with different widths and/or spacing in different directions on a particular layer, some embodiments define, for each available routing direction on the particular layer, an “unroutable” bloated region about a previously defined geometry (e.g.

Abstract: Some embodiments of the invention provide a routing method. The routing method receives a set of nets to route in a region of an integrated circuit (“IC”) layout. The routing method defines routes for the nets in a manner that ensures that each segment of each route is not less than a minimum length that is required for the segment. In some embodiments, the routing method identifies a route for a net by performing one or more path search operations, where each path search operation identifies one set of path expansions that can be used to define a segment of a route for the net. A path search operation in some embodiments performs a viability check for each path expansion that it identifies, in order to ensure that any segment that might eventually result from an identified set of path expansions satisfies its minimum required length.

Abstract: model for use with one or more EDA tools (such as placing, routing, etc). An LPD wiring model allows at least one wiring layer to have a set of regions that each have a different preferred direction than the particular wiring layer. In addition, each region has a local preferred direction that differs from the local preferred direction of at least one other region in the set. Furthermore, at least two regions have two different polygonal shapes and no region in the set encompasses another region in the set. Some embodiments also provide a Graphical User Interface (GUI) that facilitates a visual presentation of an LPD design layout and provides tools to create and manipulate LPD regions in a design layout.

Abstract: Some embodiments of the invention provide a routing method. The routing method receives a set of nets to route in a region of an integrated circuit (“IC”) layout. The routing method defines routes for the nets in a manner that ensures that each segment of each route is not less than a minimum length that is required for the segment. In some embodiments, the routing method identifies a route for a net by performing one or more path search operations. Each path search operation identifies one set of path expansions that can be used to define a segment of a route for the net. A path search operation in some embodiments performs a viability check for each path expansion that it identifies, in order to ensure that any segment that might eventually result from an identified set of path expansions satisfies its minimum required length.

Abstract: Some embodiments of the invention provide a Local Preferred Direction (LPD) wiring model for use with one or more EDA tools (such as placing, routing, etc). An LPD wiring model allows at least one wiring layer to have a set of regions that each have a different preferred direction than the particular wiring layer. In addition, each region has a local preferred direction that differs from the local preferred direction of at least one other region in the set. Furthermore, at least two regions have two different polygonal shapes and no region in the set encompasses another region in the set. Some embodiments also provide a Graphical User Interface (GUI) that facilitates a visual presentation of an LPD design layout and provides tools to create and manipulate LPD regions in a design layout.

Abstract: Some embodiments of the invention provide a method for routing. The method defines at least one wiring layer that has at least two regions with different local preferred wiring directions. The method then uses the differing local preferred wiring directions to define a global route on the wiring layer. The two regions are a first region with a first local preferred wiring direction, and a second region with a second local preferred wiring direction. The global route traverses the first region along the first local preferred wiring direction and traverses the second region along the second local preferred wiring direction.

Abstract: Some embodiments of the invention provide a method for defining routes in a design layout. The method defines at least one particular wiring layer that has at least two regions with different local preferred wiring directions. The method then uses the differing local preferred wiring directions to define a detailed route on the wiring layer. In some embodiments, the method defines a first route that traverse first and second regions between two layers by using a first via that has a first pad in the second region. The method also defines a second route that traverses the second region and a third region in the two layers by using a second via that has a second pad in the second region, where the first and second pads have different shapes.

Abstract: Some embodiments of the invention provide novel methods for representing items in a design layout. For instance, they use a method that identifies several half-planes, that when intersected, define the shape of the item. Some embodiments use a method that (1) identifies a first set of location data for the item with respect to a first coordinate system, (2) identifies a second set of location data for the item with respect to a second coordinate system, and (3) specifies the item in terms of the first and second set of location data. In some embodiments, both the first and second coordinate systems have first and second coordinate axes. Some embodiments use a method that receives a first set of data that defines the item with respect to a first coordinate system of the design layout.