Abstract: An adjustment-determining method includes obtaining a mathematical model relating an operating parameter of the deposition line to a quality function defined from a quality measurement of a stack of thin layers deposited by the deposition line on a transparent substrate; obtaining a value of the quality function from a value of the quality measurement measured at the outlet of the deposition line on a stack of thin layers deposited by the deposition line on a substrate while the deposition line was set so that an operating parameter had a current value; and automatically determining by the mathematical model an adjustment value for the current value of the operating parameter serving to reduce a difference that exists between the value obtained for the quality function and a target value selected for the quality function for the stack of thin layers.

Abstract: An adjustment-determining method includes obtaining a mathematical model relating an operating parameter of the deposition line to a quality function defined from a quality measurement of a stack of thin layers deposited by the deposition line on a transparent substrate; obtaining a value of the quality function from a value of the quality measurement measured at the outlet of the deposition line on a stack of thin layers deposited by the deposition line on a substrate while the deposition line was set so that an operating parameter had a current value; and automatically determining by the mathematical model an adjustment value for the current value of the operating parameter serving to reduce a difference that exists between the value obtained for the quality function and a target value selected for the quality function for the stack of thin layers.

Abstract: This transparent layered element (1) has two smooth outer main surfaces (2A, 4A) and comprises: two outer layers (2, 4), which each form one of the two outer main surfaces (2A, 4A) of the element (1) and which are constituted of dielectric materials having substantially the same refractive index (n2, n4), and a central layer (3) inserted between the two outer layers, this central layer (3) being formed either by a single layer which is a dielectric layer having a refractive index different from that of the outer layers or a metal layer, or by a stack of layers which comprises at least one dielectric layer having a refractive index different from that of the outer layers or a metal layer. Each contact surface (S0, S1) between two adjacent layers of the element (1), which are one a dielectric layer and the other a metal layer, or which are two dielectric layers having different refractive indices, is textured and parallel to the other textured contact surfaces.

Abstract: A transparent substrate provided with a stack of thin layers includes an alternation of n functional layers having reflection properties in the infrared region and/or in solar radiation with n?2 and of n+1 coatings including one or more dielectric layers, so that each functional layer is positioned between two coatings, the coatings and the functional layers are numbered according to their position with respect to the transparent substrate, the lower coating 1 is placed above the transparent substrate and below the functional layer 1, the intermediate coatings 2 to n are placed between two functional layers and the upper coating n+1 is placed above the functional layer n, wherein at least one of the upper or intermediate coatings 2 to n+1 includes at least one barrier coating including at least two barrier layers, one layer including silicon and one layer based on aluminum nitride.

Abstract: A transparent substrate provided with a stack of thin layers includes an alternation of n functional layers having reflection properties in the infrared region and/or in solar radiation with n?2 and of n+1 coatings including one or more dielectric layers, so that each functional layer is positioned between two coatings, the coatings and the functional layers are numbered according to their position with respect to the transparent substrate, the lower coating 1 is placed above the transparent substrate and below the functional layer 1, the intermediate coatings 2 to n are placed between two functional layers and the upper coating n+1 is placed above the functional layer n, wherein at least one of the upper or intermediate coatings 2 to n+1 includes at least one barrier coating including at least two barrier layers, one layer including silicon and one layer based on aluminum nitride.

Abstract: The subject of the invention is a material comprising a glass substrate coated on at least one of its faces with a thin-film multilayer comprising, starting from said substrate, at least one lower dielectric layer, at least one functional layer made of a metal or metal nitride, at least one upper dielectric layer and at least one layer of titanium oxide at least partially crystallized in the anatase form, said metal or metal nitride being based on Nb, NbN, W, WN, Ta, TaN or any of their alloys or solid solutions.

Abstract: An organic light-emitting diode device includes a carrier including a transparent layered element exhibiting specular transmission and diffuse reflection, the element being used as an extraction solution. A process for manufacturing the device and the use of the carrier in an organic light-emitting diode device are presented. Lastly, there is provided a carrier coated with an electrode suitable in particular for preparing the diode devices.

Abstract: A projection or back-projection method, according to which a glazing including two main external surfaces, used as projection or back-projection screen, and a projector are available. The method includes projecting, by virtue of the projector, images viewable by spectators onto one of the sides of the glazing. The glazing includes a transparent layered element exhibiting diffuse reflection properties.

Abstract: The invention relates to a solar control glazing comprising a glass substrate provided, on one of its faces, with a stack of layers having a solar protection function, in which the stack comprises the sequence of the following layers, starting from the surface of the glass substrate: a lower layer for protecting the upper layers against the migration of the alkali metal ions resulting from the glass substrate, a layer of an indium tin oxide (ITO), an upper layer for protecting the ITO layer against atmospheric oxygen, said glazing being characterized in that said upper and lower layers are essentially composed of a dielectric material chosen from a silicon nitride, an aluminum nitride or their mixture and in that intermediate layers made of a chromium-comprising metal, which layers are optionally partially or completely oxidized and/or nitrided, are positioned on either side of and in contact with said ITO layer, the thickness of said intermediate layers being between 0.5 and 3 nanometers.

Abstract: A substrate, or a transparent glass substrate, including a thin-film multilayer including an alternation of four functional metallic layers, or functional layers based on silver or on a metal alloy containing silver, and five antireflection coatings, each antireflection coating including at least one antireflection layer, so that each functional metallic layer is positioned between two antireflection coatings. The thickness of the second, third, and fourth functional metallic layers starting from the substrate is substantially identical, with a ratio of the thickness of one layer to the thickness of the preceding layer between 0.9 and 1.1 inclusive of these values, and the thickness of the first functional metallic layer is about half the thickness of the second functional metallic layer, with a ratio of the thickness of the second metallic layer to the thickness of the first functional metallic layer between 1.9 and 2.2 inclusive of these values.

Abstract: A glazing with a solar control property includes a glass substrate on which a stack of layers is deposited, the stack including a layer consisting of an alloy including nickel and copper, wherein the atomic percentage of copper is greater than 1% and less than 25% and wherein the atomic percentage of nickel is greater than 75% and less than 99%.

Abstract: A glazing with a solar control property includes a glass substrate on which a stack of layers is deposited, the stack including a layer consisting of an alloy including nickel and copper, wherein the atomic percentage of copper is greater than 1% and less than 25% and wherein the atomic percentage of nickel is greater than 75% and less than 99%.

Abstract: This transparent layered element (1) has two smooth outer main surfaces (2A, 4A) and comprises: two outer layers (2, 4), which each form one of the two outer main surfaces (2A, 4A) of the element (1) and which are constituted of dielectric materials having substantially the same refractive index (n2, n4), and a central layer (3) inserted between the two outer layers, this central layer (3) being formed either by a single layer which is a dielectric layer having a refractive index different from that of the outer layers or a metal layer, or by a stack of layers which comprises at least one dielectric layer having a refractive index different from that of the outer layers or a metal layer. Each contact surface (S0, S1) between two adjacent layers of the element (1), which are one a dielectric layer and the other a metal layer, or which are two dielectric layers having different refractive indices, is textured and parallel to the other textured contact surfaces.

Abstract: The invention relates to porous dielectric layers obtained from pore-forming precursors and from matrix precursors. According to the invention, the pore-forming precursors used are chosen form molecules of myrtenol, ethyl chrysanthemumate, jasmine, trimethylbenzene, their positional isomers and their substituted or hydrogenated derivatives. The dielectric constant of the layer obtained is less than or equal to 2.5, starting from matrix precursors having a dielectric constant of less than or equal to 4.

Abstract: The subject of the invention is a material comprising a glass substrate coated on at least one of its faces with a thin-film multilayer comprising, starting from said substrate, at least one lower dielectric layer, at least one functional layer made of a metal or metal nitride, at least one upper dielectric layer and at least one layer of titanium oxide at least partially crystallized in the anatase form, said metal or metal nitride being based on Nb, NbN, W, WN, Ta, TaN or any of their alloys or solid solutions.

Abstract: The invention relates to porous dielectric layers obtained from pore-forming precursors and from matrix precursors. According to the invention, the pore-forming precursors used are chosen form molecules of myrtenol, ethyl chrysanthemumate, jasmine, trimethylbenzene, their positional isomers and their substituted or hydrogenated derivatives. The dielectric constant of the layer obtained is less than or equal to 2.5, starting from matrix precursors having a dielectric constant of less than or equal to 4.

Abstract: The invention relates to a method for destroying effluents issuing from a reactor, the said effluents being transported through at least one pump towards plasma means capable of destroying at least certain bonds in the molecules of the PFC or HFC type between the fluorine and the other elements of these molecules of the PFC or HFC type, in order to generate first species which are then converted to second gaseous, liquid or solid species before interaction of these second species with dry or wet purifying means. According to the invention, at least one reducing agent is injected upstream and/or downstream of the plasma, but upstream of the purifying means, in order to react with the first species created.